Matching process controllers for improved matching of process
AssigneeApplied Materials, Inc.
InventorsJames Robert Moyne, Jimmy Iskandar
Life of this patent
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Abstract
Described herein are methods and systems for chamber matching in a manufacturing facility. A method may include receiving a first chamber recipe advice for a first chamber and a second chamber recipe advice for a second chamber. The chamber recipe advices describe a set of tunable inputs and a set of outputs for a process. The method may further include adjusting at least one of the set of first chamber input parameters or the set of second chamber input parameters and at least one of the set of first chamber output parameters or the set of second chamber output parameters to substantially match the first and second chamber recipe advices.
Claims20
A method comprising:
- receiving first chamber recipe advice for a first process chamber of a plurality of process chambers of a semiconductor fabrication facility, wherein the first chamber recipe advice comprises a set of first chamber input parameters and a set of first chamber output parameters;
- receiving second chamber recipe advice for a second process chamber of the plurality of process chambers, wherein the second chamber recipe advice comprises a set of second chamber input parameters and a set of second chamber output parameters;
- and
- generating, by a processing device, composite chamber recipe advice based on the first chamber recipe advice and the second chamber recipe advice, wherein the composite chamber recipe advice comprises a set of composite input parameters and a set of composite output parameters, semiconductor fabrication being based on the composite chamber recipe advice.
A system comprising:
- a memory;
- and
- a processing device coupled to the memory, the processing device to:
- receive first chamber recipe advice for a first process chamber of a plurality of process chambers of a semiconductor fabrication facility, wherein the first chamber recipe advice comprises a set of first chamber input parameters and a set of first chamber output parameters;
- receive second chamber recipe advice for a second process chamber of the plurality of process chambers, wherein the second chamber recipe advice comprises a set of second chamber input parameters and a set of second chamber output parameters;
- and
- generate composite chamber recipe advice based on the first chamber recipe advice and the second chamber recipe advice, wherein the composite chamber recipe advice comprises a set of composite input parameters and a set of composite output parameters, semiconductor fabrication being based on the composite chamber recipe advice.
A non-transitory machine-readable storage medium storing instructions that, when executed by a processing device, cause the processing device to perform operations comprising:
- receiving first chamber recipe advice for a first process chamber of a plurality of process chambers of a semiconductor fabrication facility, wherein the first chamber recipe advice comprises a set of first chamber input parameters and a set of first chamber output parameters;
- receiving second chamber recipe advice for a second process chamber of the plurality of process chambers, wherein the second chamber recipe advice comprises a set of second chamber input parameters and a set of second chamber output parameters;
- and
- generating composite chamber recipe advice based on the first chamber recipe advice and the second chamber recipe advice, wherein the composite chamber recipe advice comprises a set of composite input parameters and a set of composite output parameters, semiconductor fabrication being based on the composite chamber recipe advice.
Dependencies are inferred from the claim text.