Method for fabricating semiconductor device, pattern writing apparatus, recording medium recording program, and pattern transfer apparatus

A non-transitory computer readable medium recording a program to cause a computer to execute:

• storing first pattern data of a desired pattern that is to be formed on a semiconductor substrate to a storage device;
• dividing a pattern region of the desired pattern into a plurality of sub-regions;
• calculating combination condition including a shape of illumination light for transferring and a mask pattern obtained by correcting a partial pattern in the sub-region of the desired pattern formed on a mask used during transferring for each of the plurality of sub-regions, to make a dimension error of the partial pattern of each of the plurality of sub-regions smaller when transferred to the semiconductor substrate;
• outputting correlation data of the combination condition calculated and second pattern data of the mask pattern to be a corresponding pattern shape for each of the sub-regions;
• and
• controlling the illumination light to pass the illumination light through the second pattern data on the mask, then pass through at least one optical system, to impinge onto the semiconductor substrate to thereby form the desired pattern onto the semiconductor substrate using the second pattern data of the mask pattern.