Method for manufacturing array substrate and display device
AssigneesHkc Corporation Limited, Chongqing Hkc Optoelectronics Technology Co., Ltd.
InventorChung-Kuang Chien
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Abstract
The present disclosure provides a method for manufacturing an array substrate and a display device. The method for manufacturing the array substrate includes providing a substrate; disposing a metal layer material on the substrate; disposing thermal reactive photoresist material on the metal layer material; obtaining a thermal reactive photoresist layer using a mask process and a thermal reaction process; and obtaining a metal layer by an etching process.
Claims15
A method for manufacturing an array substrate, comprising:
- providing a substrate;
- disposing a metal layer material on the substrate;
- disposing thermal reactive photoresist material on the metal layer material;
- obtaining a thermal reactive photoresist layer using a mask process and a thermal reaction process;
- and
- obtaining a metal layer by an etching process;
- wherein disposing thermal reactive photoresist material on the metal layer material comprises:
- disposing the thermal reactive photoresist material at a position of the wire segments of the metal layer;
- and
- disposing a ordinary photoresist material different with the thermal photoresist at a position of non-wire segments of the metal layer.
A method for manufacturing an array substrate, comprising:
- providing a substrate;
- disposing a metal layer material on the substrate;
- disposing a thermal reactive photoresist material on the metal layer material;
- obtaining a preliminary pattern of a metal layer on the thermal reactive photoresist material using a mask process;
- obtaining predetermined reaction data of the thermal reactive photoresist material according to a gap requirement of the metal layer of the array substrate;
- obtaining the pattern of the metal layer by acting on the thermal reactive photoresist material according to the predetermined reaction data:
- the predetermined reaction data comprises a predetermined temperature and a predetermined time;
- obtaining a thermal reactive photoresist layer by a developing process:
- obtaining the metal layer by an etching process;
- and
- removing residual thermal reactive photoresist layer;
- wherein disposing thermal reactive photoresist material on the metal layer material comprises:
- disposing the thermal reactive photoresist material at a position of the wire segments of the metal laver;
- and
- disposing a ordinary photoresist material different with the thermal photoresist at a position of non-wire segments of the metal layer.
A display device, comprising:
- a drive circuit;
- and
- a display panel;
- wherein the display panel comprises a method for manufacturing an array substrate,
- the method for manufacturing an array substrate, comprising:
- providing a substrate;
- disposing a metal layer material on the substrate;
- disposing thermal reactive photoresist material on the metal layer material;
- obtaining a thermal reactive photoresist layer using a mask process and a thermal reaction process:
- and
- obtaining a metal layer by an etching process;
- wherein disposing thermal reactive photoresist material on the metal layer material comprises:
- disposing the thermal reactive photoresist material at a position of the wire segments of the metal layer;
- and
- disposing a ordinary photoresist material different with the thermal photoresist at a position of non-wire segments of the metal layer.
Dependencies are inferred from the claim text.