Optical device, projection optical system, exposure apparatus using the same, and method for manufacturing article
AssigneeCanon Kabushiki Kaisha
InventorChoshoku Sai
Life of this patent
Estimating the term…
Abstract
An optical device includes a mirror, and a plurality of actuators configured to deform a shape of a reflecting surface of the mirror. At least some of the plurality of actuators are arranged on a plurality of concentric circles arranged in such a manner that the concentric circles are arranged denser as positions of the concentric circles are located farther from a center of the reflecting surface of the mirror, and at least some of the plurality of actuators are arranged at equal intervals in circumferential directions of the concentric circles.
Claims10
An optical device comprising:
- a mirror;
- and
- a plurality of actuators configured to deform a shape of a reflecting surface of the mirror,
- wherein the plurality of actuators are arranged on a plurality of concentric circles arranged in such a manner that the concentric circles are arranged denser as positions of the concentric circles are located farther from a center of the reflecting surface of the mirror, and at least some of the plurality of actuators are arranged at equal intervals in circumferential directions of the concentric circles, and
- wherein each of the plurality of actuators is arranged at one of positions corresponding to each term of extrema of a rotationally symmetric component when a shape of the reflecting surface to be deformed is expanded in Zernike polynomials.
A projection optical system for projecting a pattern of a mask onto a substrate, the projection optical system comprising an optical device including a mirror, and a plurality of actuators configured to deform a shape of a reflecting surface of the mirror,
- wherein the plurality of actuators are arranged on a plurality of concentric circles arranged in such a manner that the concentric circles are arranged denser as positions of the concentric circles are located farther from a center of the reflecting surface of the mirror, and at least some of the plurality of actuators are arranged at equal intervals in circumferential directions of the concentric circles, and
- wherein each of the plurality of actuators is arranged at one of positions corresponding to each term of extrema of a rotationally symmetric component when a shape of the reflecting surface to be deformed is expanded in Zernike polynomials.
An exposure apparatus for exposing a substrate, comprising a projection optical system for projecting a pattern of a mask onto the substrate,
- wherein the projection optical system includes an optical device including a mirror, and a plurality of actuators configured to deform a shape of a reflecting surface of the mirror, and
- wherein the plurality of actuators are arranged on a plurality of concentric circles arranged in such a manner that the concentric circles are arranged denser as positions of the concentric circles are located farther from a center of the reflecting surface of the mirror, and at least some of the plurality of actuators are arranged at equal intervals in circumferential directions of the concentric circles, and
- wherein each of the plurality of actuators is arranged at one of positions corresponding to each term of extrema of a rotationally symmetric component when a shape of the reflecting surface to be deformed is expanded in Zernike polynomials.
A method for manufacturing an article, the method comprising:
- exposing a substrate using an exposure apparatus for exposing the substrate;
- developing the exposed substrate;
- and
- manufacturing an article from the developed substrate,
- wherein the exposure apparatus including a projection optical system for projecting a pattern of a mask onto the substrate,
- wherein the projection optical system including an optical device including a mirror, and a plurality of actuators configured to deform a shape of a reflecting surface of the mirror,
- wherein the plurality of actuators are arranged on a plurality of concentric circles arranged in such a manner that the concentric circles are arranged denser as positions of the concentric circles are located farther from a center of the reflecting surface of the mirror, and at least some of the plurality of actuators are arranged at equal intervals in circumferential directions of the concentric circles, and
- wherein each of the plurality of actuators is arranged at one of positions corresponding to each term of extrema of a rotationally symmetric component when a shape of the reflecting surface to be deformed is expanded in Zernike polynomials.
Dependencies are inferred from the claim text.