Simultaneous multi-elements analysis type X-ray fluorescence spectrometer, and simultaneous multi-elements X-ray fluorescence analyzing method

A simultaneous multi-elements analysis type X-ray fluorescence spectrometer comprising:

• a sample table on which a sample that is a semiconductor wafer is placed;
• a conveyance arm configured to place and remove the sample on and from the sample table;
• a stage configured to cause the sample table to move;
• an X-ray source configured to irradiate the sample with primary X-rays;
• a fixed goniometer provided for each of wavelengths to be measured, the fixed goniometer having a spectroscopic device and a detector, and being configured to measure an intensity of fluorescent X-rays generated from the sample;
• and
• a control unit configured to control the conveyance arm, the stage, the X-ray source, and the fixed goniometer, and to measure intensities, of the fluorescent X-rays, at a plurality of measurement points on a surface of the sample, thereby to obtain distribution of the measured intensities on the sample, wherein
• the sample table has a cutout formed therein, through which the conveyance arm is allowed to pass in a vertical direction,
• the control unit includes a background correction unit, and
• the background correction unit is configured to
• regarding respective measurement points on a blank wafer, previously store, as background intensities at the measurement points, intensities obtained by subtracting a measured intensity at a reference measurement point located above the cutout from each of measured intensities at the measurement points, and
• regarding respective measurement points on an analytical sample, subtract the background intensities at the measurement points from measured intensities at the measurement points, thereby to correct background.