Advanced in-situ particle detection system for semiconductor substrate processing systems

A method for in-situ particle detection in a semiconductor manufacturing system, comprising:

• receiving a substrate in a factory interface through a factory interface slit door;
• transferring the substrate from the factory interface to a transfer chamber or a process chamber through a load-lock slit door;
• transferring the substrate from the transfer chamber or the process chamber to a substrate support in the factory interface through the load-lock slit door;
• and
• continuously monitoring particle concentration in the factory interface during the transferring the substrate from the factory interface to the transfer chamber or the process chamber through the load-lock slit door and from the transfer chamber or the process chamber to the substrate support in the factory interface through the load-lock slit door, wherein continuously monitoring particle concentration comprises:
• directing air via a fan over the substrate support and a particle detector positioned downstream from the substrate support,
• receiving the air in a particle detector tube of the particle detector,
• introducing the air into the particle detector through the particle detector tube, and
• detecting a particle concentration in the air using the particle detector.