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US 10,883,804 B2Granted
Infra-red device
AssigneeAms Sensors UK Limited
InventorsFlorin Udrea, Syed Zeeshan Ali, Richard Henry Hopper
Life of this patent
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Abstract
We disclose herein an infra-red (IR) device comprising a substrate comprising an etched cavity portion and a substrate portion; a dielectric layer disposed on the substrate. The dielectric layer comprises a dielectric membrane which is adjacent, or directly above, or below the etched cavity portion of the substrate. The device further comprises a reflective layer on or in or above or below the dielectric membrane to enhance emission or absorption of infrared light at one or more wavelengths.
Claims17
An infra-red (IR) device comprising:
- a substrate comprising an etched cavity portion and a substrate portion;
- a dielectric layer disposed on the substrate, wherein the dielectric layer comprises a dielectric membrane, wherein the dielectric membrane is adjacent to the etched cavity portion of the substrate;
- a reflective layer on or in the dielectric membrane to enhance emission or absorption of an entire spectrum of infrared light wavelengths, and wherein the reflective layer consists of a single continuous layer, and wherein the reflective layer extends through an entire area of the dielectric membrane.
Dependencies are inferred from the claim text.