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US 10,883,210 B2Granted
Tacking system for stitching along a predetermined path
AssigneeOne Sciences, Inc.
InventorRobert S. Blenis, Jr.
Life of this patent
Estimating the term…
Abstract
Disclosed are various systems and features for use with a machine, such as a sewing machine, to facilitate tacking operations that may aid in the securing of objects to substrates prior to subsequent operations. Such systems and features may be useful in the context of performing an action along a self-guided path on a substrate.
Claims14
A system for performing tacking operations, the system comprising:
- a patch disposed on a surface of a substrate, the patch being located at a position on the substrate in an operational area;
- a guiding apparatus;
- a sewing system;
- a vision system;
- and
- a patch library system configured to store, in a non-transient computer readable medium, information associated with a patch, wherein the information associated with the patch comprises at least one of:
- a tacking stitch location associated with the patch, and
- a predetermined path for performing operations on the patch.
5 more elements
A computer implemented method for performing a tacking operation, the method comprising:
- determining, by a vision system, at least one tacking stitch location effective to maintain a position of a patch disposed on a surface of a substrate, based at least on at least one of:
- imaging data of the patch, location information associated with the position of the patch;
- performing a tacking operation at one or more of the at least one tacking stitch location;
- determining, by the vision system, if at least one of patch movement and patch stretching has occurred due to the tacking operation;
- if at least one of patch movement and patch stretching has occurred, determining updated stitch tacking locations for any remaining stitch tacking locations that have yet to undergo a tacking operation;
- and
- if present, performing a tacking operation at one or more updated tacking stitch locations.
4 more elements
A guiding apparatus comprising:
- a tacking system comprising:
- a vision system;
- a sewing system;
- an operational area;
- and
- a feature avoidance system that enables the tacking system to avoid, during the tacking operation, one or more non-processable features of at least one of a patch and a substrate,
- wherein the tacking system is configured to perform a tacking operation on the patch disposed on a surface of the substrate, wherein the tacking operation comprises securing the patch to the substrate by sewing a plurality of tacking stitches.
4 more elements
Dependencies are inferred from the claim text.