Method for producing III-N templates and the reprocessing thereof and III-N template
AssigneeFreiberger Compound Materials GmbH
InventorsFrank Lipski, Ferdinand Scholz, Martin Klein, Frank Habel
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Abstract
There is provided a template comprising a substrate comprising sapphire and at least one III-N crystal layer, wherein III denotes at least one element of the main group III of the periodic table of the elements, selected from the group of Al, Ga and In, wherein in a region of the at least one III-N layer above the substrate comprises a mask material as an interlayer, wherein the III-N crystal layer of the template is defined by one or both of the following values (i)/(ii) of the deformation εxx: (i) at room temperature the εxx value lies in the range of <0; and (ii) at growth temperature the εxx value lies in the range of εxx≤0.
Claims14
A template comprising a substrate comprising sapphire and at least one III-N crystal layer, wherein III denotes at least one element of the main group III of the periodic table of the elements, selected from the group of Al, Ga and In, wherein in a region of the at least one III-N layer above the substrate comprises a mask material as an interlayer, wherein the III-N crystal layer of the template is defined by one or both of the following values (i)/(ii) of the deformation εxx:
- (i) at room temperature the εxx value lies in the range of <0;
- and
- (ii) at growth temperature the εxx value lies in the range of εxx≤0,
- wherein the interlayer is a discontinuous layer that, as viewed along a face surface of the template, the interlayer comprises nanometer-scale islands of mask material and microscopic and/or nanometer scale gaps lacking mask material.
A template comprising a substrate comprising sapphire and at least one III-N crystal layer, wherein III denotes at least one element of the main group III of the periodic table of the elements, selected from the group of Al, Ga and In, wherein in a region of the at least one III-N layer above the substrate comprises a mask material as an interlayer, the interlayer being a discontinuous layer that, as viewed along a face surface of the template, comprises nanometer-scale islands of mask material and microscopic and/or nanometer scale gaps lacking mask material,
- wherein the distance between the interlayer and the substrate is at most 300 nm.
Dependencies are inferred from the claim text.