Method of manufacturing lithography template

A method of manufacturing a lithography template, comprising:

• (a) loading a substrate into a process chamber, the substrate having a pattern region and a non-contacting region at center and peripheral portions thereof, respectively;
• (b) placing the substrate on a substrate support having a protruding portion and a bottom portion such that a back surface of the substrate is supported by the protruding portion along an outer edge of the substrate;
• (c) heating the substrate by supplying a first hot gas into a space defined by the protruding portion and the bottom portion while supplying a second hot gas into the process chamber, the space being bounded at its periphery by the protruding portion and extending continuously along a back surface of the center and peripheral portions of the substrate such that the first hot gas uniformly heats the substrate across the pattern region and the non-contacting region;
• and
• (d) processing the substrate after performing (c) by supplying a process gas into the process chamber while supplying the first hot gas into the space.