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US 10,883,164 B2Granted
Mask frame assembly including pattern position adjusting mechanism and pattern position adjusting method using the mask frame assembly
AssigneeSamsung Display Co., Ltd.
InventorsMingoo Kang, Jongbum Kim
Life of this patent
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Abstract
A mask frame assembly includes: a mask including a deposition pattern through which a deposition material is deposited to a deposition target; a frame to which the mask comprising the deposition pattern is combined; and a pattern position adjusting mechanism which is coupled to the frame and configured to apply a force to the frame such that a position of the deposition pattern of the mask combined to the frame is changed.
Claims6
A deposition pattern position adjusting method of a mask frame assembly, the deposition pattern position adjusting method comprising:
- preparing the mask frame assembly comprising:
- a mask comprising a deposition pattern through which a deposition material is deposited to a deposition target,
- a frame combined to the mask,
- a plurality of rotors combined with the frame and arranged along an edge of the frame, and
- a wire connected between two rotors among the plurality of rotors and having a tension along the edge of the frame;
- determining a location of the deposition pattern to be adjusted;
- and
- deforming the frame to adjust the location of the deposition pattern,
- wherein the deforming the frame comprises changing the tension of the wire by rotating a rotor, from among the two rotors, which corresponds to the location of the deposition pattern.
6 more elements
Dependencies are inferred from the claim text.