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US 10,882,839 B2Granted
Salt and photoresist composition containing the same
AssigneeSumitomo Chemical Company, Limited
InventorsTatsuro Masuyama, Natsuki Okada, Koji Ichikawa
Life of this patent
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Abstract
A salt containing a group represented by the formula (aa): wherein Xa and Xb independently each represent an oxygen atom or a sulfur atom, a ring W represents a C3-C18 heterocycle which has a carbonate ester structure and which can have a substituent, and * represents a binding position is provided.
Claims18
A salt comprising an anion represented by formula (aa2):
- wherein Xa and Xb independently each represent an oxygen atom or a sulfur atom,
- a ring W represents a C3-C18 heterocycle which has a carbonate ester structure and which can have a substituent,
- a ring W1 represents a C3-C18 non-aromatic hydrocarbon ring which can have a substitute and in which a methylene group can be replaced by —O—, —S—, —CO— or —SO2—,
- L1 represents a C1-C24 divalent saturated hydrocarbon group in which a hydrogen atom can be replaced by a fluorine atom or a hydroxyl group and in which a methylene group can be replaced by —O— or —CO—, and
- Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group.
2 more elements
A salt comprising a group represented by the formula (aa):
- wherein Xa and Xb independently each represent an oxygen atom or a sulfur atom,
- a ring W represented 1,3-dioxan-2-one ring, and
- * represents a binding position.
Dependencies are inferred from the claim text.