Freeze cleaning apparatus
AssigneeToshiba Memory Corporation
InventorsHideaki Sakurai, Kyo Otsubo, Minako Inukai
Life of this patent
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Abstract
A freeze cleaning apparatus includes a table for supporting a processing target substrate having a first surface and a second surface opposite to the first surface, a liquid supply unit positioned to supply a cleaning liquid onto the second surface of the processing target substrate that is placed such that the first surface faces the table, and a cooling gas discharge unit in the table to supply a cooling gas to the first surface side of the processing target substrate. A gap between the table and the processing target substrate is set such that the cooling gas flows as a laminar flow between the table and the processing target substrate.
Claims4
A freeze cleaning apparatus, comprising:
- a table that faces a first surface of a processing target substrate, the processing target substrate having a second surface opposite the first surface;
- a liquid supply unit configured to supply a cleaning liquid onto the second surface of the processing target substrate placed such that the first surface faces the table;
- a side wall that surrounds a space between the processing target substrate and the table;
- a cooling gas discharge unit that is provided in the table to discharge a cooling gas into the space;
- a drain that discharges the cooling gas from the space to the outside;
- and
- a valve located on the drain, wherein
- the space between the processing target substrate and the table is a closed space.
Dependencies are inferred from the claim text.