Cleaning composition
AssigneeThe Procter & Gamble Company
InventorsFrank Hulskotter, Patrick Firmin August Delplancke, Bjoern Ludolph
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Abstract
A hard surface cleaning composition comprising: a) from about 1% to about 60% by weight of the composition of a surfactant system, wherein said surfactant system comprises an anionic surfactant and amphoteric/zwitterionic system wherein the amphoteric to zwitterionic weight ratio is from about 2:1 to about 1:2, wherein said amphoteric surfactant comprises an alkyl dimethyl amine oxide; and b) from about 0.1% to about 10% by weight of the composition of a cleaning amine of Formula(I): wherein the radicals R1, R2, R3, R4 and R5 are independently selected from NH2, —H, linear or branched alkyl or alkenyl having from about 1 to about 10 carbon atoms and n is from 1 to 3 and wherein at least one of the radicals is NH2.
Claims8
A hard surface cleaning composition comprising:
- a) from about 1% to about 60% by weight of the composition of a surfactant system, wherein said surfactant system comprises from about 8% to about 40% by weight of the composition of C8-C18 alkyl ethoxy sulfate with a degree of ethoxylation of from about 0.2 to about 3 and from about 2% to 15% by weight of the composition of C10-C14 alkyl dimethyl amine oxide;
- and
- b) from about 0.5% to about 5% by weight of the composition of a cleaning amine of Formula(I):
- wherein R2 is NH2, one of R1, R3, R4 and R5 is CH3 and the remaining radicals are H and n is 1, wherein the pH of the composition is from about 7 to about 12, as measured at 25 degrees Celsius and 10% aqueous concentration in distilled water.
Dependencies are inferred from the claim text.