# US 10,873,029 B2 · Method for producing vapor deposition mask, vapor deposition mask preparation body, method for producing organic semiconductor element, method for producing organic EL display, and vapor deposition mask > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,873,029 B2 - Document ID: US10873029B2 - Status: Granted - Kind: B2 - Application number: 16/841,858 - Filed: 2020-04-07 - Published: 2020-07-23 - Granted: 2020-12-22 - Earliest claimed: 2015-07-03 - Assignees: Dai Nippon Printing Co., Ltd. - Applicants: Dai Nippon Printing Co., Ltd. - Inventors: Toshihiko Takeda; Kumiko Hokari; Yasuko Sone; Katsunari Obata - Web page: https://patentgrep.com/patent/US10873029B2 ## CPC - C23C 14/042: {using masks} - H10K 71/166: {using selective deposition, e.g. using a mask} - H10K 59/10: OLED displays - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES ## Abstract A vapor deposition mask preparation body in which a metal mask is provided on one surface of a resin plate for obtaining a resin mask, and a protective sheet with peel strength not less than about 0.0004 N/10 mm and less than about 0.2 N/10 mm in conformity with JIS Z-0237:2009 is provided on the other surface of the resin plate is prepared, with respect to the vapor deposition mask preparation body, the resin plate is irradiated with laser light from the metal mask side to form a resin mask opening corresponding to a pattern to be produced by vapor deposition in the resin plate, and the protective sheet is peeled off from the resin mask in which the resin mask opening corresponding to the pattern to be produced by vapor deposition is formed. ## Claims ### Claim 1 A method for producing a vapor deposition mask including a metal mask in which a metal mask opening is formed and a resin mask in which a resin mask opening corresponding to a pattern to be produced by vapor deposition is formed at a position overlapping with the metal mask opening, the metal mask and the resin mask being stacked, the method comprising: a step of preparing a vapor deposition mask preparation body in which the metal mask is provided on one surface of a resin plate for obtaining the resin mask, and a protective sheet with self-adsorption and peelability is adsorbed on the other surface of the resin plate; a step of irradiating, with respect to the vapor deposition mask preparation body, the resin plate with laser light from the metal mask side to form the resin mask opening corresponding to the pattern to be produced by vapor deposition in the resin plate; and a step of peeling off the protective sheet from the resin mask in which the resin mask opening corresponding to the pattern to be produced by vapor deposition is formed. ### Claim 2 (depends on 1) The method for producing a vapor deposition mask according to claim 1, wherein the protective sheet adsorbed on the other surface of the resin plate is a protective sheet containing any one or both of a silicone-based resin and a urethane-based resin. ### Claim 3 (depends on 1) The method for producing a vapor deposition mask according to claim 1, wherein the vapor deposition mask preparation body is a vapor deposition mask preparation body in which the metal mask is provided on one surface of the resin plate for obtaining the resin mask, and a plurality of the protective sheets are adsorbed on the other surface of the resin plate. ### Claim 4 (depends on 2) The method for producing a vapor deposition mask according to claim 2, wherein the vapor deposition mask preparation body is a vapor deposition mask preparation body in which the metal mask is provided on one surface of the resin plate for obtaining the resin mask, and a plurality of the protective sheets are adsorbed on the other surface of the resin plate. ### Claim 5 (depends on 1) The method for producing a vapor deposition mask according to claim 1, wherein the resin plate is made of a resin material having a thermal expansion coefficient of 16 ppm/° C. or less. ### Claim 6 (depends on 1) The method for producing a vapor deposition mask according to claim 1, wherein the resin plate is made of a resin material having a rate of humidity absorption of 1.0% or less. ### Claim 7 (depends on 1) The method for producing a vapor deposition mask according to claim 1, wherein the resin plate is made of a resin material having a thermal expansion coefficient of 16 ppm/° C. or less and a rate of humidity absorption of 1.0% or less. ### Claim 8 (depends on 1) The method for producing a vapor deposition mask according to claim 1, wherein a thickness of the resin plate is 3 μm to 25 μm inclusive. ### Claim 9 (depends on 1) The method for producing a vapor deposition mask according to claim 1, wherein a thickness of the resin plate is 4 μm to 8 μm inclusive. ### Claim 10 (depends on 1) The method for producing a vapor deposition mask according to claim 1, wherein the pattern is a high-definition pattern exceeding 400 ppi. ### Claim 11 (depends on 1) The method for producing a vapor deposition mask according to claim 1, wherein a cross-sectional shape of the resin mask opening broadens toward the metal mask side. ### Claim 12 (depends on 1) The method for producing a vapor deposition mask according to claim 1, wherein a thickness of the metal mask is 5 μm to 100 μm inclusive. ### Claim 13 (depends on 1) The method for producing a vapor deposition mask according to claim 1, wherein a thickness of the metal mask is 5 μm to 35 μm inclusive. ### Claim 14 (depends on 1) The method for producing a vapor deposition mask according to claim 1, wherein the metal mask is made of an invar material. ### Claim 15 (depends on 1) The method for producing a vapor deposition mask according to claim 1, wherein a cross-sectional shape of the metal mask opening broadens toward a vapor deposition source.