# US 10,872,933 B2 · Display substrate and manufacturing method thereof, display panel and display apparatus

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- Number: US 10,872,933 B2
- Document ID: US10872933B2
- Status: Granted
- Kind: B2
- Application number: 16/567,704
- Filed: 2019-09-11
- Published: 2020-07-16
- Granted: 2020-12-22
- Earliest claimed: 2019-01-11
- Assignees: Boe Technology Group Co., Ltd.
- Applicants: Boe Technology Group Co., Ltd.
- Inventors: Guoying Wang; Zhen Song
- Web page: https://patentgrep.com/patent/US10872933B2

## CPC

- H10K 59/60: OLEDs integrated with inorganic light-sensitive elements, e.g. with inorganic solar cells or inorganic photodiodes
- G09G 3/3225: using an active matrix
- H10K 59/131: Interconnections, e.g. wiring lines or terminals
- H10K 71/00: Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K 71/20: Changing the shape of the active layer in the devices, e.g. patterning
- H10K 59/126: Shielding, e.g. light-blocking means over the TFTs
- H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES
- G09G: ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION (arrangements for transferring data between digital computers and displays G06F3/14; static indicating arrangements comprising an association of a number of separate sources or light control cells G09F9/00; static indicating arrangements comprising integral associations of a number of light sources H01J, H01K, H10H, H05B33/12; scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission, details thereof H04N1/00)

## Abstract

The present disclosure relates to the field of the display technology and provides a display substrate and a manufacturing method thereof, a display panel, and a display apparatus. The manufacturing method of the display substrate includes forming an optical compensation control thin film transistor on a side of a base substrate; forming a conductor protective layer on a side of the optical compensation control thin film transistor facing away from the base substrate; forming an optical detecting device material layer on a side of the conductor protective layer facing away from the base substrate; forming an optical detecting device through patterning the optical detecting device material layer; and forming a conductor pattern layer through patterning the conductor protective layer; where, the optical detecting device is electrically connected with a source electrode or a drain electrode of the optical compensation control thin film transistor through the conductor pattern layer.

## Claims

### Claim 1

A display substrate, comprising:
a base substrate;
an optical compensation control thin film transistor on a side of the base substrate, the optical compensation control thin film transistor comprising:
an active layer on the base substrate;
a gate insulating layer on a side of the active layer facing away from the base substrate;
a gate on a side of the gate insulating layer facing away from the base substrate;
an interlayer dielectric layer on a side of the gate facing away from the base substrate; and
a source electrode and a drain electrode on a side of the interlayer dielectric layer facing away from the base substrate;
a conductor pattern layer on a side of the optical compensation control thin film transistor facing away from the base substrate;
an optical detecting device on a side of the conductor pattern layer facing away from the base substrate;
a light shielding layer on the base substrate; and
a buffer layer on a side of the light shielding layer facing away from the base substrate, the optical compensation control thin film transistor being disposed on the buffer layer, and an orthographic projection of the active layer on the base substrate being located within an orthographic projection of the light shielding layer on the base substrate;
wherein the optical detecting device is electrically connected with the source electrode or the drain electrode through the conductor pattern layer, and an orthographic projection of the optical detecting device on the base substrate and an orthographic projection of the conductor pattern layer on the base substrate are at least partially overlapped.

### Claim 2 (depends on 1)

The display substrate according to claim 1, wherein the orthographic projection of the optical detecting device on the base substrate is located within the orthographic projection of the conductor pattern layer on the base substrate.

### Claim 3 (depends on 1)

The display substrate according to claim 1, wherein the optical detecting device comprises:
a photoelectric conversion layer on the side of the conductor pattern layer facing away from the base substrate; and
a first electrode on a side of the photoelectric conversion layer facing away from the base substrate.

### Claim 4 (depends on 3)

The display substrate according to claim 3, further comprising:
an insulating layer on a side of the optical detecting device facing away from the base substrate, and the insulating layer being provided with a via hole; and
a second electrode on a side of the insulating layer facing away from the base substrate, the second electrode being connected with the first electrode through the via hole.

### Claim 5

A display panel, comprising:
a display substrate, comprising:
a base substrate;
an optical compensation control thin film transistor on a side of the base substrate, the optical compensation control thin film transistor comprising:
an active layer on the base substrate;
a gate insulating layer on a side of the active layer facing away from the base substrate;
a gate on a side of the gate insulating layer facing away from the base substrate;
an interlayer dielectric layer on a side of the gate facing away from the base substrate; and
a source electrode and a drain electrode on a side of the interlayer dielectric layer facing away from the base substrate;
a conductor pattern layer on a side of the optical compensation control thin film transistor facing away from the base substrate;
an optical detecting device on a side of the conductor pattern layer facing away from the base substrate;
a light shielding layer on the base substrate; and
a buffer layer on a side of the light shielding layer facing away from the base substrate, the optical compensation control thin film transistor being disposed on the buffer layer, and an orthographic projection of the active layer on the base substrate being located within an orthographic projection of the light shielding layer on the base substrate;
wherein the optical detecting device is electrically connected with the source electrode or the drain electrode through the conductor pattern layer, and an orthographic projection of the optical detecting device on the base substrate and an orthographic projection of the conductor pattern layer on the base substrate are at least partially overlapped.

### Claim 6 (depends on 5)

The display panel according to claim 5, wherein the orthographic projection of the optical detecting device on the base substrate is located within the orthographic projection of the conductor pattern layer on the base substrate.

### Claim 7 (depends on 5)

The display panel according to claim 5, wherein the optical detecting device comprises:
a photoelectric conversion layer on the side of the conductor pattern layer facing away from the base substrate; and
a first electrode on a side of the photoelectric conversion layer facing away from the base substrate.

### Claim 8 (depends on 5)

The display panel according to claim 5, further comprising a back plate, the back plate comprising back plate glass and an organic light emitting layer on the back plate glass, the organic light emitting layer being opposite to the optical detecting device.

### Claim 9 (depends on 5)

The display panel according to claim 5, wherein the display panel is implemented in a display apparatus.