# US 10,872,743 B2 · Sample holding mechanism, manufacturing method for same, and charged particle beam device > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,872,743 B2 - Document ID: US10872743B2 - Status: Granted - Kind: B2 - Application number: 16/029,751 - Filed: 2018-07-09 - Published: 2019-01-24 - Granted: 2020-12-22 - Earliest claimed: 2017-07-19 - Assignees: Hitachi, Ltd. - Applicants: Hitachi, Ltd. - Inventors: Akira Sugawara; Yoshio Takahashi; Tetsuya Akashi; Toshiaki Tanigaki - Web page: https://patentgrep.com/patent/US10872743B2 ## CPC - H01J 37/20: Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support - G03H 5/00: Holographic processes or apparatus using particles or using waves other than those covered by groups G03H1/00 or G03H3/00 for obtaining holograms; Processes or apparatus for obtaining an optical image from them (G03H1/22 takes precedence; construction of electron microscopes H01J37/26; {investigating or analysing materials by the use of microwaves G01N22/00, by the use of particles wave or X-rays G01N23/00, G21K7/00}) - H01J 37/045: {Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge} - H01J 37/22: Optical {, image processing} or photographic arrangements associated with the tube - H01J 37/244: Detectors; Associated components or circuits therefor - H01J 37/2955: {using scanning ray} - G03H 2224/04: Particle beam, e.g. e-beam - H01J 2237/043: Beam blanking - H01J 2237/20: Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated - H01J 2237/2614: Holography or phase contrast, phase related imaging in general, e.g. phase plates - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - G03H: HOLOGRAPHIC PROCESSES OR APPARATUS (holograms, e.g. point holograms, used as ordinary optical elements G02B5/32; producing stereoscopic or other three-dimensional effects G02B30/00; diffraction-grating systems G02B27/44; systems using moiré fringes G02B27/60; optical logic elements G02F3/00; stereo-photography G03B35/00; photosensitive materials or processes for photographic purposes G03C; {stereo-photographic or similar processes G03C9/00}; apparatus for processing exposed photographic materials G03D; analogue computers performing mathematical operations with the aid of optical elements G06E3/00; authentication by radiation, of concealed information carried by holograms or diffraction gratings G06K19/16; holographic storage G11B7/0065, G11C13/04; {stereoscopic or other three dimensional effects in television systems H04N13/00}) ## Abstract Continuous and automatic acquisition of electron beam holograms is made possible by using a sample holding mechanism that includes a sample end region that has a linear shape that is suited for electron beam holography, separates a thin-film rectangular window with an extreme-thin support film that supports a sample being disposed and a rectangular hole that has a linear-shaped edge and through which a reference wave is transmitted from each other, and configures a part of a layer that is thicker than the support film. ## Claims ### Claim 1 A sample holding mechanism comprising: a window with a support film that supports a sample being disposed; a hole that has a linear-shaped edge and through which a reference wave is transmitted; and a layer that is thicker than the support film that is disposed on an edge of the window. ### Claim 2 (depends on 1) The sample holding mechanism according to claim 1, wherein a plurality of the windows and a plurality of the holes are included, and respective regions of the layer that is thicker than the support film that is disposed on the edge of each of the plurality of windows are continuously linked together as one layer. ### Claim 3 (depends on 1) The sample holding mechanism according to claim 1, wherein the hole is a rectangular hole, the window is a rectangular window, and a plurality of the rectangular holes and a plurality of the rectangular windows are periodically arrayed. ### Claim 4 (depends on 3) The sample holding mechanism according to claim 3, wherein a width of the rectangular hole is at least two times a width of the rectangular window. ### Claim 5 (depends on 3) The sample holding mechanism according to claim 3, wherein a width of a region of the thick layer that separates the rectangular hole and the rectangular window from each other is not more than about 500 nanometers. ### Claim 6 (depends on 1) The sample holding mechanism according to claim 1, wherein a substance that configures the window includes amorphous carbon, graphite, graphene, boron nitride, beryllium oxide, silicon oxide, and silicon nitride that each contain a light element as a principal component and a thickness of the substance is not more than about 50 nanometers. ### Claim 7 A charged particle beam device comprising: an electron source; a sample holding mechanism that includes a window with a support film that supports a sample being disposed, a hole that has a linear-shaped edge and through which a reference wave is transmitted, and a layer that is thicker than the support film that is disposed on an edge of the window and in which a plurality of the windows and a plurality of the holes are arrayed; a mechanical movement mechanism that performs movement of the sample holding mechanism; an image shift deflection optical system that performs parallel shifting of an image along a linear-shaped side of the hole in the sample holding mechanism; a detector that detects an electron beam that is emitted from the electron source and is transmitted through the sample holding mechanism; and a control unit that performs visual field selection by controlling the image shift deflection optical system and the mechanical movement mechanism and controls to continuously acquire images from an array of the windows and the holes on the basis of an output from the detector. ### Claim 8 (depends on 7) The charged particle beam device according to claim 7, further comprising a beam blanking system that turns on/off the electron beam. ### Claim 9 (depends on 7) The charged particle beam device according to claim 7, further comprising an electron beam biprism that includes an electron beam biprism wire that is disposed in parallel with the linear-shaped edge of the hole, wherein the control unit controls to continuously acquire a plurality of sample holograms and a plurality of reference holograms from the array of the windows and the holes. ### Claim 10 (depends on 9) The charged particle beam device according to claim 9, wherein the control unit controls to dispose the linear-shaped edge of the hole and the electron beam biprism wire in parallel with each other by rotating the sample holding mechanism or the electron beam biprism. ### Claim 11 (depends on 9) The charged particle beam device according to claim 9, wherein the control unit controls to select an observation visual field in the window and to acquire the sample holograms. ### Claim 12 (depends on 9) The charged particle beam device according to claim 9, wherein the control unit controls to select an observation visual field in the hole and to acquire the reference holograms.