# US 10,870,918 B2 · Synthesis of structured carbon material from organic materials

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- Number: US 10,870,918 B2
- Document ID: US10870918B2
- Status: Granted
- Kind: B2
- Application number: 16/571,911
- Filed: 2019-09-16
- Published: 2020-01-23
- Granted: 2020-12-22
- Earliest claimed: 2016-04-14
- Assignees: University of Pittsburgh—Of the Commonwealth System of Higher Education
- Applicants: University of Pittsburgh—Of the Commonwealth System of Higher Education
- Inventors: Haitao Liu; Feng Zhou
- Web page: https://patentgrep.com/patent/US10870918B2

## CPC

- C23C 16/45525: {Atomic layer deposition [ALD]}
- C01B 32/05: Preparation or purification of carbon not covered by groups C01B32/15, C01B32/20, C01B32/25, C01B32/30
- C01B 32/90: Carbides
- C23C 16/403: {of aluminium, magnesium or beryllium}
- C23C 18/1283: {Control of temperature, e.g. gradual temperature increase, modulation of temperature}
- C01P 2002/82: by IR- or Raman-data
- C01P 2004/04: obtained by TEM, STEM, STM or AFM
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- C01B: NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; {METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C}
- C01P: INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS

## Abstract

A method of forming a carbonized composition includes providing an organic composition, forming a protective layer over the organic composition, increasing temperature to carbonize the organic composition and for a period of time to form the carbonized composition, and removing the protective layer from the carbonized composition.

## Claims

### Claim 1

A method of forming a carbonized composition, comprising:
providing an organic composition;
forming a protective layer over the organic composition to form a barrier between the organic composition and the surrounding environment which is impermeable to decomposition gases of the organic composition during carbonization;
increasing temperature to carbonize the organic composition and for a period of time to form the carbonized composition; and
removing the protective layer from the carbonized composition.

### Claim 2 (depends on 1)

The method of claim 1 wherein the organic composition is formed to have a predetermined shape or conformation.

### Claim 3 (depends on 2)

The method of claim 2 wherein the predetermined shape or conformation of the organic composition is substantially maintained in the carbonized composition.

### Claim 4 (depends on 3)

The method of claim 3 wherein the organic composition is deposited upon a substrate before forming the protective layer over the organic composition.

### Claim 5 (depends on 2)

The method of claim 2 wherein the carbonized composition is a porous carbon material.

### Claim 6 (depends on 2)

The method of claim 2 wherein the temperature is increased to a temperature within the range of approximately 780° C. to approximately 2072° C.

### Claim 7 (depends on 2)

The method of claim 2 wherein the protective layer comprises Al2O3.

### Claim 8 (depends on 7)

The method of claim 7 wherein the protective layer is removed via etching with H3PO4.

### Claim 9 (depends on 2)

The method of claim 2 wherein the protective layer is deposited via a thin film deposition technique.

### Claim 10 (depends on 9)

The method of claim 9 wherein the protective layer is deposited via atomic layer deposition, vacuum deposition, sputtering, chemical vapor deposition or laser assisted deposition.

### Claim 11 (depends on 10)

The method of claim 10 wherein the protective layer is deposited via atomic layer deposition.

### Claim 12 (depends on 9)

The method of claim 9 wherein the thickness of the protective layer is in the range of 2 nm to 100 micrometers.

### Claim 13 (depends on 9)

The method of claim 9 wherein the protective layer comprises Al2O3.

### Claim 14 (depends on 13)

The method of claim 13 wherein the protective layer is removed via etching with H3PO4.

### Claim 15

A method of forming a carbonized composition, comprising:
providing an organic composition, wherein the organic composition is formed to have a predetermined shape or conformation;
forming a protective layer over the organic composition by depositing the protective layer via a thin film deposition technique;
increasing temperature to carbonize the organic composition and for a period of time to form the carbonized composition; and
removing the protective layer from the carbonized composition.

### Claim 16 (depends on 15)

The method of claim 15 wherein the protective layer is deposited via atomic layer deposition, vacuum deposition, sputtering, chemical vapor deposition or laser assisted deposition.

### Claim 17 (depends on 16)

The method of claim 16 wherein the protective layer is deposited via atomic layer deposition.

### Claim 18 (depends on 15)

The method of claim 15 wherein the thickness of the protective layer is in the range of 2 nm to 100 micrometers.

### Claim 19 (depends on 15)

The method of claim 15 wherein the protective layer is impermeable to decomposition gases of the organic composition during carbonization.