# US 10,870,224 B2 · Method of manufacturing antireflection film > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,870,224 B2 - Document ID: US10870224B2 - Status: Granted - Kind: B2 - Application number: 15/861,023 - Filed: 2018-01-03 - Published: 2018-05-24 - Granted: 2020-12-22 - Earliest claimed: 2015-07-06 - Assignees: FUJIFILM Corporation - Applicants: FUJIFILM Corporation - Inventors: Daiki Wakizaka; Ayako Matsumoto - Web page: https://patentgrep.com/patent/US10870224B2 ## CPC - B29C 41/12: Spreading-out the material on a substrate {, e.g. on the surface of a liquid} - B29C 41/22: Making multilayered or multicoloured articles - B29C 41/42: Removing articles from moulds, cores or other substrates {(B29C33/444 and B29C37/0017 take precedence)} - B32B 5/16: characterised by features of a layer formed of particles, e.g. chips, powder {or granules (layer formed of natural mineral particles B32B19/00; layer being formed of wood fibres, chips or particles B32B21/02)} - B32B 27/20: using fillers, pigments, thixotroping agents - G02B 1/111: using layers comprising organic materials - G02B 1/118: having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures - B29K 2071/00: Use of polyethers {, e.g. PEEK, i.e. polyether-etherketone or PEK, i.e. polyetherketone or derivatives thereof}, as moulding material - B29K 2509/08: Glass - B29L 2007/00: Flat articles, e.g. films or sheets (B29L2024/00 takes precedence) - B32B 38/08: Impregnating - B32B 38/10: Removing layers, or parts of layers, mechanically or chemically - B32B 2457/20: Displays, e.g. liquid crystal displays, plasma displays - G02B 7/00: Mountings, adjusting means, or light-tight connections, for optical elements - B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00) - B32B: LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM - G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS - B29K: INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR {MOULDS, } REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS - B29L: INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES ## Abstract Provided is a method of manufacturing an antireflection film including, in order: a step (1) of providing a layer (a) containing a curable compound (a1) and a particle (a2) having an average primary particle diameter of 100 nm to 380 nm and a layer (b) containing a compound (b1) incompatible with the curable compound (a1) so that the particle (a2) is buried in a layer defined by combining the layer (a) and the layer (b), on a substrate; a step (2) of curing the layer (a) in a state in which the particle (a2) is buried in the layer defined by combining the layer (a) and the layer (b); and a step (3) of removing the layer (b) to form an uneven shape on a surface of the layer (a) with the particle (a2). ## Claims ### Claim 1 A method of manufacturing an antireflection film, comprising, in order: a step (1) of providing a layer (a) comprising at least one of curable compounds (a1) and particles (a2) having an average primary particle diameter of 100 nm to 380 nm and a layer (b) comprising at least one of compounds (b1) incompatible with the at least one of curable compounds (a1) so that the particles (a2) are buried in a layer which is a combination of the layer (a) and the layer (b), on a substrate; a step (2) of curing the layer (a) in a state in which the particles (a2) are buried in the layer which is a combination of the layer (a) and the layer (b); and a step (3) of removing the layer (b) to form a moth eye structure on a surface of the layer (a) with the particles (a2). ### Claim 2 (depends on 1) The method of manufacturing an antireflection film according to claim 1, wherein the layer (a) and the layer (b) are provided on the substrate in this order by coating. ### Claim 3 (depends on 1) The method of manufacturing an antireflection film according to claim 1, wherein the at least one of compounds (b1) are a silicone-based component, a hydrocarbon-based component, an ester-based component, a natural animal and vegetable oils and fats, semisynthetic oils and fats, higher fatty acid, higher alcohols, or a fluorine-based component at 50° C. ### Claim 4 (depends on 1) The method of manufacturing an antireflection film according to claim 1, wherein the at least one of compounds (b1) has a boiling point of 110° C. or higher and a kinematic viscosity of 0.1 mm2/s to 100,000 mm2/s at 25° C. ### Claim 5 (depends on 4) The method of manufacturing an antireflection film according to claim 4, wherein a difference between a surface tension of a surface of the layer (a) and a surface tension of the at least one of compounds (b1) having a boiling point of 110° C. or higher is 0 to 10 mN/m. ### Claim 6 (depends on 1) The method of manufacturing an antireflection film according to claim 1, wherein a maximum transmittance at a wavelength of 250 nm to 300 nm, in a thickness in the step (2), of the at least one of compounds (b1) is 20% or greater. ### Claim 7 (depends on 1) The method of manufacturing an antireflection film according to claim 1, wherein, in the step (1), the layer (b) is formed by laminating a laminate obtained by providing the layer (b) on a temporary support to the layer (a). ### Claim 8 (depends on 7) The method of manufacturing an antireflection film according to claim 7, wherein the layer (b) is a pressure sensitive adhesive layer. ### Claim 9 (depends on 7) The method of manufacturing an antireflection film according to claim 7, wherein a difference between a surface tension of a surface of the layer (a) and a surface tension of a surface on the layer (b) side of the laminate obtained by providing the layer (b) on the temporary support is −10 to 15 mN/m. ### Claim 10 (depends on 7) The method of manufacturing an antireflection film according to claim 7, wherein a maximum transmittance at a wavelength of 250 nm to 300 nm of the laminate obtained by providing the layer (b) on the temporary support is 20% or greater. ### Claim 11 (depends on 1) The method of manufacturing an antireflection film according to claim 1, wherein, in the step (3), a solvent that dissolves the at least one of compounds (b1) without dissolving the substrate is used. ### Claim 12 (depends on 1) The method of manufacturing an antireflection film according to claim 1, wherein, after the step (3), in a direction orthogonal to a surface of the substrate, a plurality of the particles (a2) do not exist. ### Claim 13 (depends on 1) The method of manufacturing an antireflection film according to claim 1, wherein, in the steps (1) and (2), a total thickness of a thickness of a portion of the layer (a) in which the particles (a2) do not exist and a thickness of the layer (b) is greater than an average primary particle diameter of the particles (a2). ### Claim 14 (depends on 1) The method of manufacturing an antireflection film according to claim 1, wherein the at least one of curable compounds (a1) is a compound having three or more (meth)acryloyl groups in one molecule. ### Claim 15 (depends on 1) The method of manufacturing an antireflection film according to claim 1, wherein the particles (a2) are metal oxide particles. ### Claim 16 (depends on 1) The method of manufacturing an antireflection film according to claim 1, wherein the particles (a2) are particles subjected to surface modification. ### Claim 17 (depends on 1) The method of manufacturing an antireflection film according to claim 1, further comprising: a step (1-2) of causing a portion of the at least one of curable compounds (a1) to permeate the substrate between the steps (1) and (2). ### Claim 18 (depends on 17) The method of manufacturing an antireflection film according to claim 17, wherein, in the step (1-2), a laminate having the substrate, the layer (a) and the layer (b) is heated. ### Claim 19 (depends on 18) The method of manufacturing an antireflection film according to claim 18, wherein a temperature during the heating is 80° C. to 180° C. ### Claim 20 (depends on 18) The method of manufacturing an antireflection film according to claim 18, wherein a boiling point of the at least one of compounds (b1) is the temperature during the heating or greater.