# US 10,865,130 B2 · Apparatus and method for producing alkaline water for cleaning electronic device

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- Number: US 10,865,130 B2
- Document ID: US10865130B2
- Status: Granted
- Kind: B2
- Application number: 16/265,031
- Filed: 2019-02-01
- Published: 2019-05-30
- Granted: 2020-12-15
- Earliest claimed: 2016-08-02
- Assignees: Nomura Micro Science Co., Ltd.
- Applicants: Nomura Micro Science Co., Ltd.
- Inventors: Takayuki Jizaimaru
- Web page: https://patentgrep.com/patent/US10865130B2

## CPC

- C02F 9/00: Multistage treatment of water, waste water or sewage
- B01D 19/0031: {by filtration}
- B01D 61/00: Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor (separation of gases or vapours by diffusion B01D53/22)
- B01F 21/00: Dissolving (separating by dissolving B01D; dissolving to effect cooling F25D5/00)
- C02F 1/20: by degassing, i.e. liberation of dissolved gases (degasification of liquids in general B01D19/00; arrangement of degassing apparatus in boiler feed supply F22D)
- C02F 1/68: by addition of specified substances, e.g. trace elements, for ameliorating potable water (medicinal water A61K)
- C02F 1/78: with ozone {(C02F1/4672 takes precedence)}
- B01D 2315/22: Membrane contactor
- B01F 23/231244: {Dissolving, hollow fiber membranes}
- B01F 23/23764: {Hydrogen}
- C02F 1/001: {Processes for the treatment of water whereby the filtration technique is of importance (C02F1/44 takes precedence; construction of filters in general B01D24/00 - B01D41/00)}
- C02F 1/283: {using coal, charred products, or inorganic mixtures containing them}
- C02F 1/32: with ultraviolet light
- C02F 1/42: by ion-exchange (ion-exchange in general B01J)
- C02F 1/441: {by reverse osmosis}
- C02F 1/444: {by ultrafiltration or microfiltration}
- C02F 1/66: by neutralisation; pH adjustment (for degassing C02F1/20; using ion-exchange C02F1/42; for flocculation or precipitation of suspended impurities C02F1/52; for removing dissolved compounds C02F1/58)
- C02F 1/685: {Devices for dosing the additives}
- C02F 2103/04: for obtaining ultra-pure water
- C02F 2103/346: {from semiconductor processing, e.g. waste water from polishing of wafers}
- C02F 2209/07: Alkalinity
- H10P 70/15: {by wet cleaning only (H10P70/52 takes precedence)}
- C02F: TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE (separation in general B01D; special arrangements on waterborne vessels of installations for treating water, waste water or sewage, e.g. for producing fresh water, B63J; adding materials to water to prevent corrosion C23F; treating radioactively-contaminated liquids G21F9/04; regeneration of reactants for recirculation into processes, see the relevant places for the processes)
- B01D: SEPARATION (separating solids from solids by wet methods B03B, B03D; by pneumatic jigs or tables B03B; by other dry methods B07; magnetic or electrostatic separation of solid materials from solid materials or fluids, separation by high-voltage electric fields B03C; centrifuges, vortex apparatus B04; presses per se for squeezing-out liquid from liquid-containing material B30B9/02; treatment of water C02F, e.g. softening by ion-exchange C02F1/42; {arrangements of air intake cleaners in gas turbine plants F02C7/05} ; arrangements or mounting of filters in air-conditioning, air-humidification or ventilation F24F13/28)
- B01F: MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING (mixing paints B44D3/06)
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

To provide method and apparatus for producing alkaline water, capable of preventing mixture of fine particles derived from a gas dissolving membrane device into hydrogen water. An apparatus for producing alkaline water for cleaning electronic device includes: a pH adjusting device 11 configured to adjust ultrapure water to be alkaline; a deaeration device 13 configured to deaerate the ultrapure water adjusted to be alkaline; and a gas dissolving membrane device 14 having a gas permeable membrane to dissolve functional gas into the deaerated ultrapure water.

## Claims

### Claim 1

An apparatus for producing alkaline water for cleaning electronic device, the apparatus comprising:
a pH adjusting device to add a pH regulator into ultrapure water to keep the ultrapure water alkaline;
a feed water pump to feed the ultrapure water kept alkaline at a discharge pressure 0.2 MPa to 0.4 MPa;
a deaerator to deaerate the ultrapure water fed from the feed water pump; and
a gas dissolver having a gas permeable membrane to dissolve functional gas into the deaerated ultrapure water.

### Claim 2 (depends on 1)

The apparatus for producing alkaline water for cleaning electronic device according to claim 1, wherein the pH adjusting device adjusts pH of the ultrapure water at 8 to 11.

### Claim 3 (depends on 1)

The apparatus for producing alkaline water for cleaning electronic device according to claim 1, wherein the pH adjusting device adds, to the ultrapure water, at least one alkaline component selected from the group consisting of ammonia, sodium tetramethylammonium hydroxide, 2-hydroxyethyl trimethylammonium hydroxide (choline), sodium hydroxide, and potassium hydroxide.

### Claim 4 (depends on 3)

The apparatus for producing alkaline water for cleaning electronic device according to claim 3, wherein the alkaline component is ammonia.

### Claim 5 (depends on 3)

The apparatus for producing alkaline water for cleaning electronic device according to claim 3, wherein the pH adjusting device adds, to the ultrapure water, the alkaline component in an amount that a concentration thereof in the alkaline water becomes 2 mg/L to 100 mg/L.

### Claim 6 (depends on 1)

The apparatus for producing alkaline water for cleaning electronic device according to claim 1, wherein the functional gas is at least one selected from the group consisting of hydrogen gas, ozone gas, and noble gas.

### Claim 7 (depends on 6)

The apparatus for producing alkaline water for cleaning electronic device according to claim 6, wherein the functional gas is hydrogen gas.

### Claim 8 (depends on 7)

The apparatus for producing alkaline water for cleaning electronic device according to claim 7, wherein a hydrogen gas concentration in the alkaline water is 1.0 mg/L to 1.6 mg/L.

### Claim 9 (depends on 1)

The apparatus for producing alkaline water for cleaning electronic device according to claim 1, wherein the gas permeable membrane comprises at least one material selected from the group consisting of polypropylene and polyvinylidene fluoride.

### Claim 10

A method for producing alkaline water for cleaning electronic device, the method comprising:
adjusting a pH of ultrapure water to keep the ultrapure water alkaline;
feeding the alkaline ultrapure water at a discharge pressure 0.2 MPa to 0.4 MPa by a feed water pump;
deaerating the alkaline ultrapure water fed by the feed water pump; and
dissolving functional gas into the deaerated alkaline ultrapure water.