Method of inspecting flow rate measuring system
AssigneeTokyo Electron Limited
InventorsJun Hirose, Norihiko Amikura, Risako Miyoshi, Shinobu Onodera
Life of this patent
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Abstract
Disclosed is a method of inspecting a flow rate measuring system used in a substrate processing system. The flow rate measuring system provides a gas flow path used for calculating a flow rate in a build-up method. A gas output by a flow rate controller of a gas supply unit of the substrate processing system may be supplied to the gas flow path. In the method, apart from a previously obtained initial value of a volume of the gas flow path, a volume of the gas flow path is obtained at the time of inspection of the flow rate measuring system. Then, the obtained volume is compared to the initial value.
Claims7
A method of inspecting an accuracy of a flow rate measuring system used in a substrate processing system,
- wherein the substrate processing system includes:
- a plurality of chamber bodies;
- a plurality of gas supply units each configured to supply a gas to an inner space of a corresponding chamber body among the plurality of chamber bodies;
- and
- a plurality of exhaust devices connected to inner spaces of the plurality of chamber bodies through a plurality of exhaust flow paths, respectively,
- wherein each of the plurality of gas supply units includes:
- a casing;
- a plurality of flow rate controllers provided within the casing;
- a first gas flow path including a plurality of first end portions connected to secondary sides of the plurality of flow rate controllers, respectively, a second end portion, and a third end portion, in which the plurality of first end portions, the second end portion, and a portion extending from the plurality of first end portions to the second end portion are provided within the casing, and the third end portion is provided outside the casing and connected to the inner space of the corresponding chamber body through an ON/OFF valve;
- and
- a first valve provided within the casing and connected to the second end portion, the flow rate measuring system includes:
- a second gas flow path including a plurality of fourth end portions and a fifth end portion, in which each of the plurality of fourth end portions is connected to the first valve of a corresponding gas supply unit among the plurality of gas supply units;
- a first pressure sensor and a second pressure sensor configured to measure a pressure within the second gas flow path;
- a second valve connected to the fifth end portion of the second gas flow path;
- and
- a third gas flow path including a sixth end portion connected to the second valve, and a plurality of seventh end portions connected to the plurality of exhaust flow paths, respectively,
- the method comprising:
- evacuating the first gas flow path of one gas supply unit among the plurality of gas supply units, the second gas flow path, and the third gas flow path;
- after execution of the evacuating, storing a gas in the first gas flow path of the one gas supply unit and the second gas flow path, in which the first valve of the one gas supply unit is opened, the second valve is closed, and the ON/OFF valve connected to the third end portion of the one gas supply unit is closed;
- acquiring a first measurement value and a second measurement value of the pressure within the second gas flow path by using the first pressure sensor and the second pressure sensor, respectively, in a state where the gas is stored in the first gas flow path of the one gas supply unit and the second gas flow path by execution of the storing of the gas;
- after execution of the acquiring of the first measurement value and the second measurement value, exhausting the gas within the second gas flow path, in which the first valve of the one gas supply unit is closed, and the second valve is opened;
- after execution of the exhausting of the gas within the second gas flow path, diffusing the gas within the first gas flow path of the one gas supply unit to the second gas flow path, in which the first valve of the one gas supply unit is opened, and the second valve is closed;
- acquiring a third measurement value and a fourth measurement value of the pressure within the second gas flow path by using the first pressure sensor and the second pressure sensor, respectively, in a state where the gas within the first gas flow path of the one gas supply unit is diffused to the second gas flow path by execution of the diffusing of the gas;
- obtaining a calculation value of a volume of the second gas flow path from a previously obtained first initial value of a volume of the first gas flow path of the one gas supply unit, one of the first measurement value and the second measurement value, and one of the third measurement value and the fourth measurement value;
- and
- comparing a previously obtained second initial value of the volume of the second gas flow path with the calculation value of the volume of the second gas flow path obtained in the obtaining step in order to inspect the accuracy of the flow rate measuring system.
Dependencies are inferred from the claim text.