Method of forming pattern on a substrate

A method of forming a pattern, comprising:

• arranging a photocurable composition on a substrate;
• bringing a mold having a concavo-convex pattern into contact with the photocurable composition;
• irradiating the photocurable composition with light to form a cured film;
• releasing the mold from the cured film;
• forming a reversal layer on the cured film having a concavo-convex pattern transferred from the mold;
• partially removing the reversal layer to expose the convexes of the concavo-convex pattern in such a manner that the reversal layer remains in the concaves of the concavo-convex pattern formed on the cured film;
• etching the photocurable composition layer using the reversal layer remaining in the concaves as a mask to form a reversal pattern, wherein
• the mold is brought into contact with the photocurable composition in an atmosphere of a soluble gas having a solubility in the photocurable composition;
• the soluble gas has a saturation solubility in the photocurable composition of at least 60.8% by volume, and
• the mold has a concavo-convex pattern height of 4 nm or more and 30 nm or less.