One-dimensional nanostructure growth on graphene and devices thereof
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChe-Wei Yang, Chi-Wen Liu, Hao-Hsiung Lin, Ling-Yen Yeh
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChe-Wei Yang, Chi-Wen Liu, Hao-Hsiung Lin, Ling-Yen Yeh
Estimating the term…
A method and structure for providing a GAA device. In some embodiments, a substrate including an insulating layer disposed thereon is provided. By way of example, a first metal portion is formed within the insulating layer. In various embodiments, a first lateral surface of the first metal portion is exposed. After exposure of the first lateral surface of the first metal portion, a first graphene layer is formed on the exposed first lateral surface. In some embodiments, the first graphene layer defines a first vertical plane parallel to the exposed first lateral surface. Thereafter, in some embodiments, a first nanobar is formed on the first graphene layer, where the first nanobar extends in a first direction normal to the first vertical plane defined by the first graphene layer.
A device, comprising:
A device, comprising:
A device, comprising:
Dependencies are inferred from the claim text.