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US 10,854,669 B2Granted
Method of manufacturing an imager and imager device
AssigneeInfineon Technologies AG
InventorsDirk Meinhold, Emanuele Bruno Bodini, Felix Braun, Hermann Gruber, Uwe Hoeckele, Dirk Offenberg, Klemens Pruegl, Ines Uhlig
Life of this patent
Estimating the term…
Abstract
Techniques are discloses regarding methods of manufacturing an imager as well as an imager device.
Claims20
A method of manufacturing a depth imager, comprising:
- providing a substrate having a photo-conversion region;
- forming a metal layer stack on a front side of the substrate;
- providing an optical microlens that focuses light towards the photo-conversion region of the substrate;
- and
- mounting the substrate onto a separate external glass substrate, the external glass substrate working in conjunction with a concave reflection structure to reflect non-absorbed light back to the photo-conversion region of the substrate.
2 more elements
A depth imager, comprising:
- a substrate having a photo-conversion region;
- a metal layer stack on a front side of the substrate;
- an optical microlens configured to focus light towards the photo-conversion region of the substrate;
- and
- an external glass substrate separate from the substrate onto which the substrate is mounted,
- wherein the external glass substrate is configured to work in conjunction with a concave reflection structure to reflect non-absorbed light back to the photo-conversion region of the substrate.
3 more elements
Dependencies are inferred from the claim text.