Back to results
US 10,854,655 B2Granted
Image sensors and methods of forming the same
AssigneeSamsung Electronics Co., Ltd.
InventorYun Ki Lee
Life of this patent
Estimating the term…
Abstract
An image sensor includes a substrate including a light-receiving region and a light-shielding region, a device isolation pattern in the substrate of the light-receiving region to define active pixels, and a device isolation region in the substrate of the light-shielding region to define reference pixels. An isolation technique of the device isolation pattern is different from that of the device isolation region.
Claims20
An image sensor comprising:
- a substrate including a first surface and a second surface;
- a plurality of photoelectric conversion parts disposed between the first surface of the substrate and the second surface of the substrate;
- a plurality of interconnection structures disposed on the first surface of the substrate;
- a light shielding pattern disposed on the second surface of the substrate;
- a first device isolation pattern disposed in the substrate and disposed below the light shielding pattern;
- and
- a second device isolation pattern disposed in the substrate,
- wherein the second device isolation pattern is not disposed below the light shielding pattern, and
- a depth of the first device isolation pattern is less than a depth of the second device isolation pattern.
6 more elements
An image sensor comprising:
- a substrate including a first surface and a second surface, and including a light shielding region and a light receiving region;
- a plurality of photoelectric conversion parts disposed between the first surface of the substrate and the second surface of the substrate;
- a plurality of interconnection structures disposed on the first surface of the substrate;
- a light shielding pattern disposed on the second surface of the substrate and disposed on the light shielding region of the substrate;
- a first device isolation pattern disposed in the light shielding region of the substrate and disposed below the light shielding pattern;
- and
- a second device isolation pattern disposed in the light receiving region of the substrate,
- wherein the second device isolation pattern is not disposed below the light shielding pattern,
- a depth of the first device isolation pattern is less than a depth of the second device isolation pattern, and
- the first device isolation pattern is spaced apart from the first surface of the substrate.
7 more elements
An image sensor comprising:
- a substrate including a first surface and a second surface, and including a light shielding region and a light receiving region;
- a plurality of photoelectric conversion parts disposed between the first surface of the substrate and the second surface of the substrate;
- a plurality of interconnection structures disposed on the first surface of the substrate;
- a light shielding pattern disposed on the second surface of the substrate and disposed on the light shielding region of the substrate;
- a first device isolation pattern disposed in the light shielding region of the substrate and disposed below the light shielding pattern;
- a second device isolation pattern disposed in the light receiving region of the substrate;
- a plurality of color filters disposed on the light receiving region of the substrate;
- and
- a grid pattern disposed between two adjacent color filters among the plurality of color filters,
- wherein a depth of the first device isolation pattern is less than a depth of the second device isolation pattern.
7 more elements
Dependencies are inferred from the claim text.