Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsKoji Ono, Hideomi Suzawa
Life of this patent
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Abstract
A metal wiring suitable for a substrate of large size is provided. The present invention is characterized in that at least one layer of conductive film is formed on an insulating surface, a resist pattern is formed on the conductive film, and the conductive film having the resist pattern is etched to form a metal wiring while controlling its taper angle α in accordance with the bias power density, the ICP power density, the temperature of lower electrode, the pressure, the total flow rate of etching gas, or the ratio of oxygen or chlorine in etching gas. The thus formed metal wiring has less fluctuation in width or length and can satisfactorily deal with an increase in size of substrate.
Claims24
A display device having a pixel portion, the pixel portion comprising:
- a transistor over a first substrate, the transistor comprising a semiconductor layer having a first channel formation region and a gate electrode provided over the semiconductor layer;
- a wiring electrically connected to one of a source region and a drain region in the semiconductor layer;
- a pixel electrode electrically connected to the other of the source region and the drain region in the semiconductor layer;
- a spacer over the transistor, the spacer overlapping with part of the wiring;
- and
- a second substrate having a plurality of coloring layers, the second substrate provided over the first substrate with the plurality of coloring layers positioned therebetween,
- wherein the spacer is overlapped with at least two of the plurality of coloring layers, and
- wherein an end of the first channel formation region is aligned with an end of the gate electrode.
A display device having a pixel portion, the pixel portion comprising:
- a transistor over a first substrate, the transistor comprising a semiconductor layer having a first channel formation region and a gate electrode provided over the semiconductor layer;
- a wiring electrically connected to one of a source region and a drain region in the semiconductor layer;
- a pixel electrode electrically connected to the other of the source region and the drain region in the semiconductor layer;
- a spacer over the transistor, the spacer overlapping with part of the wiring;
- and
- a second substrate having a plurality of coloring layers, the second substrate provided over the first substrate with the plurality of coloring layers positioned therebetween,
- wherein the spacer is overlapped with part of the plurality of coloring layers,
- wherein an end of the gate electrode has a tapered portion, and
- wherein the first channel formation region is overlapped with the tapered portion of the end of the gate electrode.
A display device having a pixel portion, the pixel portion comprising:
- a transistor over a first substrate, the transistor comprising a semiconductor layer having a first channel formation region and a gate electrode provided over the semiconductor layer;
- a source wiring electrically connected to the semiconductor layer;
- a pixel electrode electrically connected to the semiconductor layer;
- a spacer over the transistor, the spacer overlapping with part of the source wiring;
- and
- a second substrate having a plurality of coloring layers, the second substrate provided over the first substrate with the plurality of coloring layers positioned therebetween,
- wherein the spacer is overlapped with part of the plurality of coloring layers,
- wherein an end of the gate electrode has an upper tapered portion and a lower tapered portion, and
- wherein the first channel formation region is overlapped with the lower tapered portion of the gate electrode.
Dependencies are inferred from the claim text.