Dynamic leveling process heater lift
AssigneeApplied Materials, Inc.
InventorsJason M. Schaller, Michael Rohrer, Tuan Anh Nguyen, William Tyler Weaver, Gregory John Freeman, Robert Brent Vopat
Life of this patent
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Abstract
A method and apparatus for of improving processing results in a processing chamber by orienting a substrate support relative to a surface within the processing chamber. The method comprising orienting a supporting surface of a substrate support in a first orientation relative to an output surface of a showerhead, where the first orientation of the supporting surface relative to the output surface is not coplanar, and depositing a first layer of material on a substrate disposed on the supporting surface that is oriented in the first orientation.
Claims11
A method of processing a substrate in a processing chamber, comprising:
- orienting a substrate supporting surface of a substrate support in a first orientation relative to an output surface of a showerhead, wherein the first orientation of the substrate supporting surface relative to the output surface is not parallel;
- and
- depositing a first layer of material on a substrate disposed on the substrate supporting surface while the substrate supporting surface is oriented in the first orientation;
- orienting the substrate supporting surface relative to the output surface at a second orientation, wherein the second orientation of the substrate supporting surface relative to the output surface is not parallel;
- and
- depositing a second layer of material according to a second deposition process.
A method of processing a substrate support in a processing chamber, the method comprising:
- serially changing an orientation of a substrate supporting surface of a substrate support relative to an output surface of a showerhead, wherein the orientation of the substrate supporting surface relative to the output surface is not parallel while the orientation is serially changed, wherein the serially changing the orientation of the substrate supporting surface further comprises serially changing the orientation of the substrate supporting surface relative to the output surface of the showerhead using two or more servo motors;
- and
- depositing a first layer of material on a substrate disposed on the substrate supporting surface wherein the orientation of the substrate supporting surface is serially changing.
A method of processing a substrate in a processing chamber, comprising:
- orienting a substrate supporting surface of a substrate support in a first orientation relative to an output surface of a showerhead, wherein the first orientation of the substrate supporting surface relative to the output surface is not parallel;
- and
- depositing a first layer of material on a substrate disposed on the substrate supporting surface while the substrate supporting surface is oriented in the first orientation, wherein orienting the substrate supporting surface further comprises positioning the substrate supporting surface of the substrate support in the first orientation relative to the showerhead using two or more servo motors.
A method of processing a substrate in a processing chamber, comprising:
- orienting a substrate supporting surface of a substrate support in a first orientation relative to an output surface of a showerhead, wherein the first orientation of the substrate supporting surface relative to the output surface is not parallel;
- processing a first layer of material on a substrate disposed on the substrate supporting surface while the substrate supporting surface is oriented in the first orientation;
- orienting the substrate supporting surface relative to the output surface at a second orientation, wherein the second orientation of the substrate supporting surface relative to the output surface is not parallel;
- and
- processing a second layer of material at the second orientation.
Dependencies are inferred from the claim text.