Reaction chamber and plasma processing apparatus

A reaction chamber, comprising:

• a chamber body;
• a dielectric window;
• a power supplier;
• and
• a first connection member, a second connection member, a third connection member, and a fourth connection member, wherein:
• the dielectric window is provided on top of the chamber body along a vertical direction and hermetically connected with the chamber body,
• each coil of a plurality of sets of coils is wound around an outer surface of the dielectric window at an interval along the vertical direction,
• the plurality of sets of coils are connected in parallel,
• the plurality of sets of coils include first ends that are electrically coupled to the power supplier for supplying power to each set of the plurality of sets of coils, the first ends being arranged along the vertical direction,
• the plurality of sets of coils include second ends that are grounded, the second ends being arranged along the vertical direction,
• the first ends of the plurality of sets of coils are connected to the first connection member arranged vertically, the second ends of the plurality of sets of coils are connected to the second connection member arranged vertically, a length of the second connection member is shorter than a length of the first connection member, and the second ends of the plurality of sets of coils are arranged between the first ends of the plurality of sets of coils along the vertical direction, and
• the third connection member is connected with the first connection member at a first position of the first connection member, and the fourth connection member is connected with the second connection member at a second position of the second connection member, the first position and the second position being arranged within a spacing between two adjacent sets of the plurality of sets of coils, thereby improving distribution uniformity of plasma generated in the reaction chamber.