Film processing unit, substrate processing apparatus and substrate processing method

A film processing unit, comprising:

• a rotation holder that holds and rotates a substrate in a horizontal attitude;
• a processing liquid supplier that supplies a processing liquid to a surface to be processed of the substrate held by the rotation holder;
• a splash prevention member that is arranged to surround an outer peripheral end of the substrate held by the rotation holder, and receives the processing liquid splashed from the substrate rotated by the rotation holder;
• a removal liquid supplier that is configured to supply a first removal liquid for dissolving metal included in a metal-containing coating liquid, and a second removal liquid for dissolving a coating liquid included in the metal-containing coating liquid;
• and
• a guide member provided separately from the removal liquid supplier in the splash prevention member,
• wherein the guide member is configured to guide the first removal liquid that has been supplied by the removal liquid supplier to a first region of the splash prevention member, and guide the second removal liquid that has been supplied by the removal liquid supplier to a second region that is located at a position farther upward than a position of the first region of the splash prevention member.