Substrate processing apparatus and substrate processing method

A substrate processing apparatus including:

• a substrate holding unit that holds a substrate horizontally while rotating the substrate around a vertical rotational axis through its center portion,
• an opposed member having an opposed surface that is opposed to an upper surface of the substrate, and
• a processing liquid discharge unit that includes a center portion discharge port on the opposed surface, that opens being opposed to the center portion of the upper surface of the substrate, and a peripheral portion discharge port on the opposed surface, that opens being opposed to the upper surface peripheral portion of the substrate, that discharges a processing liquid from the center portion discharge port to supply the processing liquid between the substrate and the opposed surface, and discharges the processing liquid from the peripheral portion discharge port to replenish the processing liquid between the substrate and the opposed surface,
• wherein the processing liquid discharge unit includes a liquid reservoir provided in the opposed member, that is capable of accumulating the processing liquid discharged from the peripheral portion discharge port, and
• a connecting hole through which the inside of the liquid reservoir and the peripheral portion discharge port communicate, and
• fluid is distributed between the upper surface peripheral portion of the substrate and the peripheral portion discharge port on the opposed surface, the reduced pressure of the connecting hole as the fluid is distributed, being used to discharge the processing liquid accumulated in the liquid reservoir from the peripheral portion discharge port via the connecting hole.