US 10,854,448 B2 · Plasma generating device, plasma sputtering device, and plasma sputtering method

Abstract

A plasma sputtering device including one or a plurality of plasma generating devices each including an insulating tube having an expanding inner diameter and having a gas injection port formed in an end portion or a side portion thereof, a first electromagnet or a permanent magnet group which can apply a static magnetic field, and a high frequency antenna; a second electromagnet which is disposed in a region downstream of the plasma generating device(s) and which can form a curved magnetic force line structure; a target mechanism which includes a permanent magnet embedded therein and a cooling mechanism and which can apply a DC or high frequency voltage; a substrate stage facing the target mechanism; a second permanent magnet group around the substrate stage; and a heat insulating mechanism between a target material and the target mechanism.

Claims16

Dependent claims

A plasma sputtering method characterized in that one or a plurality of plasmas are generated by one or a plurality of plasma generating devices each having an insulating tube having an expanding inner diameter and having a gas injection port formed in an end portion or a side portion of the insulating tube, a first electromagnet or a permanent magnet member group which can apply a static magnetic field, and a high frequency antenna;

and the plasma or plasmas are forced to flow into a vacuum chamber and reach a local region near a target by a curved magnetic field line structure formed by a second electromagnet disposed in a downstream region, whereby ions are taken into the target.

Dependencies are inferred from the claim text.

Plasma generating device, plasma sputtering device, and plasma sputtering method

Life of this patent

Plasma generating device, plasma sputtering device, and plasma sputtering method

Life of this patent

Abstract

Claims16