Feedforward temperature control for plasma processing apparatus

A plasma processing apparatus, comprising:

• a process chamber including a temperature controlled component to be coupled to a heat sink, wherein the temperature controlled component comprises a chuck configured to support the workpiece during the processing or a showerhead configured to supply a process gas to the process chamber;
• a plasma power source coupled to the process chamber to energize a plasma during processing of a workpiece disposed in the process chamber;
• and
• a temperature controller configured to control a heat transfer between the temperature controlled component and the heat sink, wherein the temperature controller comprises a feedforward control line and a feedback control line, wherein the feedforward control line is configured to receive a plasma power value from the plasma power source as an input and outputs a feedforward control signal, wherein the feedforward control signal from the feedforward control line is multiplied by a gain value to form a modified feed forward control signal, wherein the temperature controller is configured to determine the gain value by querying a look-up table that stores a plurality of gain values, wherein each gain value in the look-up table corresponds to different plasma power values and temperature setpoints for the temperature controlled component, wherein the modified feedforward control signal is combined with a feedback control signal from the feedback control line to form a control signal, wherein the control signal of the temperature controller is to control fluid flow of a coolant between the heat sink and the process chamber, wherein the temperature controller is to modulate a pulse width modulation duty cycle to fully open and fully close a valve through which the coolant fluid flows.