Exposure apparatus and exposure method, and device manufacturing method

An exposure method of exposing a substrate with an illumination light via a projection optical system, the method comprising:

• holding the substrate with a stage disposed on a base member below the projection optical system;
• measuring positional information of the stage with an encoder system having a plurality of heads provided at the stage, each of the plurality of heads irradiating a scale member from below with a measurement beam, the scale member being provided at a metrology frame to be substantially parallel to a predetermined plane orthogonal to an optical axis of the projection optical system, and the metrology frame supporting the projection optical system;
• and
• controlling a drive system that includes a planar motor to drive the stage, based on measurement information of the encoder system,
• wherein the scale member has four sections in each of which a reflective grating is formed,
• each of the plurality of heads is capable of measuring the positional information in at least one direction, the at least one direction being at least one of two directions intersecting each other within the predetermined plane and a direction orthogonal to the predetermined plane,
• the encoder system has four head groups provided at the stage so that the four head groups face the four sections, respectively, in a movement area in which the stage is moved in an exposure operation of the substrate,
• of the four head groups, a first head group that faces a first section of the four sections ofincludes at least three heads of the plurality of heads,
• at least two heads of the at least three heads are capable of measuring the positional information in one direction of the two directions, and measure the positional information so that difference in data of the positional information is measured by the first head group, and
• the stage is moved while the first head group faces the first section, and a grid error by a variation of a grid of the first section caused by the reflective grating is calibrated based on the difference data measured by the first head group.

A making method of an exposure apparatus that exposes a substrate with an illumination light via a projection optical system, the method comprising:

• providing a body having a metrology frame that supports the projection optical system;
• providing a base member disposed below the projection optical system;
• providing a stage system having a stage and a drive system, the stage being disposed on the base member and holding the substrate, and the drive system including a planar motor to drive the stage;
• providing an encoder system that has a plurality of heads provided at the stage and measures positional information of the stage, each of the plurality of heads irradiating a scale member from below with a measurement beam, and the scale member being provided at the metrology frame to be substantially parallel to a predetermined plane orthogonal to an optical axis of the projection optical system;
• and
• providing a controller coupled to the drive system and the encoder system, the controller controlling the drive system based on measurement information of the encoder system,
• wherein the scale member has four sections in each of which a reflective grating is formed,
• each of the plurality of heads is capable of measuring the positional information in at least one direction, the at least one direction being at least one of two directions intersecting each other within the predetermined plane and a direction orthogonal to the predetermined plane,
• the encoder system has four head groups provided at the stage so that the four head groups face the four sections, respectively, in a movement area in which the stage is moved in an exposure operation of the substrate,
• of the four head groups, a first head group that faces a first section of the four sections includes at least three heads of the plurality of heads,
• at least two heads of the at least three heads are capable of measuring the positional information in one direction of the two directions, and measure the positional information so that difference data of the positional information is measured by the first head group, and
• the controller controls the drive system so that the stage is moved while the first head group faces the first section, and calibrates a grid error by a variation of a grid of the first section caused by the reflective grating, based on the difference data measured by the first head group.