Method for manufacturing a membrane assembly
AssigneeASML Netherlands B.V.
InventorsSicco Oosterhoff, Paul Janssen, Beatrijs Louise Marie-Joseph Katrien Verbrugge
Life of this patent
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Abstract
A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including a membrane layer between a supporting substrate and an attachment substrate, wherein the supporting substrate includes an inner region and a border region; processing the stack, including selectively removing the inner region of the supporting substrate, to form a membrane assembly comprising: a membrane formed from at least the membrane layer; and a support holding the membrane, the support formed at least partially from the border region of the supporting substrate. The attachment substrate can be bonded to the rest of the stack.
Claims20
A method for manufacturing a membrane assembly for EUV lithography, the method comprising:
- providing a stack comprising a membrane layer between a supporting substrate and an attachment substrate, wherein the supporting substrate comprises an inner region and a first border region;
- processing the stack, including selectively removing a portion of the attachment substrate and selectively removing the inner region of the supporting substrate, to form a membrane assembly comprising:
- a membrane formed from at least the membrane layer;
- and
- a support holding the membrane, the support formed at least partially from the first border region of the supporting substrate.
A membrane assembly for EUV lithography, the membrane assembly comprising:
- a membrane;
- and
- a support holding the membrane, the support formed from a first border region of a supporting substrate and a second border region of an attachment substrate, wherein the membrane is between the first border region of the supporting substrate and the second border region of the attachment substrate and wherein there is an aperture extending in a direction across a first surface of the membrane between portions of the first border region of the supporting substrate and an aperture extending in a direction across a second surface of the membrane between portions of the second border region of the attachment substrate.
A method for manufacturing a membrane assembly for a lithographic apparatus, the method comprising:
- providing a supporting substrate with a membrane layer;
- bonding an attachment substrate to the supporting substrate provided with the membrane layer to form a stack, wherein the membrane layer is at least sandwiched between the supporting substrate and the attachment substrate;
- and
- processing the stack, including etching the attachment substrate and selectively removing at least a region of the supporting substrate, to form a membrane assembly comprising:
- a membrane formed from at least the membrane layer, and
- a support holding the membrane, the support formed at least partially from a border region of the supporting substrate.
A method for manufacturing a membrane assembly for a lithographic apparatus, the method comprising:
- providing a supporting substrate having an average thickness of at least 600 μm with a membrane layer;
- wafer bonding an attachment substrate having an average thickness of less than 500 μm to the supporting substrate provided with the membrane layer to form a stack, wherein the membrane layer is at least sandwiched between the supporting substrate and the attachment substrate;
- and
- subsequently thinning the supporting substrate bonded to the attachment substrate to an average thickness of the supporting substrate to be less than 500 μm.
Dependencies are inferred from the claim text.