Liquid crystal display panel and manufacturing method thereof

A manufacturing method of a liquid crystal display panel, comprising steps as follows:

• S10:
• providing a first substrate, forming a black photoresist material on the first substrate, and patterning the black photoresist material to form a first black matrix;
• S20:
• forming a color resist layer on the first substrate and patterning the color resist layer to form a first color resist layer, wherein the first color resist layer includes a first color resist region and a second color resist region, the first color resist region is disposed correspondingly to a display region of the display panel, and a second color resist region is disposed correspondingly to a non-display region of the display panel;
• S30:
• forming a black photoresist material on the first color resist layer and patterning the black photoresist material to form a second black matrix, wherein the second black matrix is formed on a color resist block of the second color resist region;
• wherein the first black matrix and the second black matrix are produced in a same photomask process, comprising:
• S100:
• providing the first substrate and forming the first color resist layer on the first substrate, wherein the first color resist layer comprises the first color resist region and the second color resist region, the first color resist region is disposed correspondingly to the display region of the display panel, and the second color resist region is disposed correspondingly to the non-display region of the display panel;
• S200:
• coating the black photoresist material on the first color resist layer, and forming the first black matrix and the second black matrix through a first photomask process, wherein the second black matrix is formed on the color resist block of the second color resist region;
• wherein step S200 comprises:
• S201:
• forming the black photoresist material on the first color resist layer to form a light shielding layer;
• S202:
• light-exposing the light shielding layer by using a multi-transmittance mask plate;
• and
• S203:
• patterning the light shielding layer to form the first black matrix and the second black matrix after development;
• S300:
• providing the second substrate, bonding the second substrate to the first substrate, and injecting the liquid crystal material between the second substrate and the first substrate;
• S40:
• providing a second substrate, bonding the second substrate to the first substrate, and injecting a liquid crystal material between the second substrate and the first substrate,
• wherein the multi-transmittance mask plate comprises a first transmittance region, a second transmittance region, and a third transmittance region;
• the second transmittance region is disposed correspondingly to a color resist of the second color resist region, the third transmittance region is disposed correspondingly to a color resist of the first color resist region, and the first transmittance region is disposed correspondingly to a region except for the first color resist region and the second color resist region.