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US 10,852,528 B2Granted
Method and device for exposure of photosensitive layer
AssigneeEV Group E. Thallner GmbH
InventorsBernhard Thallner, Boris Povazay
Life of this patent
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Abstract
A method for exposing a light-sensitive layer to light using an optical system, wherein at least one light beam is generated by respectively at least one light source and pixels of an exposure pattern grid are illuminated by at least one micro-mirror device with a plurality of micro-mirrors. An affine distortion takes place, in particular a shearing, of the exposure pattern grid.
Claims5
A method for exposing a light-sensitive layer to light using an optical system, said method comprising:
- directing at least one light beam generated by at least one light source, respectively, to at least one micro-mirror device having one or more micro-mirrors to respectively illuminate one or more pixels to generate an image of the micro-mirror device;
- and
- effecting, via two cylinder lenses, a shearing of the generated image to form horizontal and/or vertical exposure pattern grid lines of a pattern grid to which the light-sensitive layer is exposed, each of the cylinder lenses having a cylinder axis,
- wherein greater than 50% of an energy of each of the pixels is found in a field of the light-sensitive layer having an image that directly corresponds with the pixel, and
- wherein a remaining amount of the energy of each of the pixels is distributed across adjacent fields to the field having the image that directly corresponds with the pixel.
2 more elements
A device for exposing a light-sensitive layer to light, the device comprising:
- at least one light source for respectively generating at least one light beam,
- at least one micro-mirror device toward which the light beam is directed by the light source, the micro-mirror device having one or more micro-mirrors configured to respectively illuminate one or more pixels to generate an image of the micro-mirror device,
- two cylinder lenses, each cylinder lens having a cylinder axis, the cylinder lenses being configured to effect a shearing of the generated image to form horizontal and/or vertical exposure pattern grid lines of a pattern grid to which the light-sensitive layer is exposed,
- wherein greater than 50% of an energy of each of the pixels is found in a field of the light-sensitive layer having an image that directly corresponds with the pixel, and
- wherein a remaining amount of the energy of each of the pixels is distributed across adjacent fields to the field having the image that directly corresponds with the pixel.
2 more elements
Dependencies are inferred from the claim text.