Surface potential measurement of dielectric materials in plasma
AssigneeUniversity of Southern California
InventorsKevin Chou, Joseph Wang
Life of this patent
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Abstract
A system for voltage measurement of dielectric material in plasma includes a vacuum chamber. The system also includes an electrostatic receiver located outside of the vacuum chamber. The system also includes a conductive probe having a first terminus in contact with the dielectric material in the vacuum chamber and a second terminus in electrical communication with the electrostatic receiver. The system also includes a non-contact electrostatic voltmeter configured to measure a floating potential of the electrostatic receiver that corresponds to a dielectric potential of the dielectric material at a location in contact with the first terminus of the conductive probe.
Claims20
A system for voltage measurement of dielectric material in plasma comprising:
- a vacuum chamber;
- an electrostatic receiver located outside of the vacuum chamber;
- a conductive probe having a first terminus in contact with the dielectric material in the vacuum chamber and a second terminus in electrical communication with the electrostatic receiver;
- and
- a non-contact electrostatic voltmeter configured to measure a floating potential of the electrostatic receiver that corresponds to a dielectric potential of the dielectric material at a location in contact with the first terminus of the conductive probe.
A method for voltage measurement of a dielectric material in plasma comprising:
- placing the dielectric material in a vacuum chamber;
- positioning a conductive probe such that a first tell sinus of the conductive probe is in contact with the dielectric material;
- coupling a second terminus of the conductive probe to an electrostatic receiver outside of the vacuum chamber;
- generating plasma in the vacuum chamber;
- and
- measuring a voltage of the dielectric material at the electrostatic receiver using a non-contact electrostatic voltmeter.
A system for voltage measurement of dielectric material in plasma comprising:
- a vacuum chamber;
- a support shelf located in the vacuum chamber and configured to support the dielectric material;
- a plasma source configured to generate plasma into the vacuum chamber;
- an electrostatic receiver located outside of the vacuum chamber;
- a first conductive probe having a first terminus in contact with the dielectric material in the vacuum chamber and a second terminus in electrical communication with the electrostatic receiver;
- and
- a non-contact electrostatic voltmeter configured to measure a floating potential of the electrostatic receiver that corresponds to a dielectric potential of the dielectric material at a location in contact with the first terminus of the first conductive probe.
Dependencies are inferred from the claim text.