Pattern structure inspection device and inspection method
AssigneesThe Wave Talk, Inc., Korea Advanced Institute of Science and Technology
InventorsYoung Dug Kim, Jongchan Park, Yongkeun Park
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Abstract
According to an aspect of the present invention, there is provided a pattern structure inspection method including irradiating a wave from a wave source onto a sample including a pattern region in which a structure having a certain pattern is provided on a substrate, collecting speckle data generated due to multiple scattering of the wave in the pattern region, by using a data collector, and analyzing whether the structure of the pattern region has a defect, by comparing the collected speckle data to reference speckle data.
Claims6
A pattern structure inspection apparatus comprising:
- a wave source for irradiating a wave onto a sample comprising a pattern region in which a structure having a certain pattern is provided on a substrate;
- a data collector for collecting speckle data generated due to multiple scattering of the irradiated wave by the sample;
- a data analyzer for receiving and analyzing the speckle data collected by the data collector, and outputting an analysis result on a display;
- and
- a multiple scattering amplifier for amplifying a number of times that the wave is multiple-scattered in the sample, by reflecting at least some waves multiple-scattered and emitted from the sample, back to the sample,
- wherein the multiple scattering amplifier comprises:
- a first multiple scattering amplifier located on an extension line passing through a center of the sample, to reflect at least some waves multiple-scattered and emitted from the sample, back to the sample;
- and
- a second multiple scattering amplifier located at an opposite side of the first multiple scattering amplifier with respect to the sample, to reflect at least some waves multiple-scattered and emitted from the sample, back to the sample,
- wherein the data collector collects the speckle data in an area between the sample and the data collector or in an internal area of the data collector.
A pattern structure inspection apparatus comprising:
- a sample holder accommodating a sample and a reference sample holder accommodating a reference sample;
- a wave source for irradiating a wave onto the sample and the reference sample;
- a data collector for collecting speckle data generated due to multiple scattering of the irradiated wave by each of the sample and the reference sample;
- a data analyzer for receiving and analyzing the speckle data collected by the data collector, and outputting an analysis result on a display;
- a multi-beam reflector for splitting the wave incident from the wave source, and providing the split waves along a plurality of paths;
- and
- a beam splitter located on the plurality of paths of the waves provided by the multi-beam reflector, to change paths of waves reflected and emitted from the sample and the reference sample, and provide the waves to the data collector,
- wherein each of the sample and the reference sample comprises a pattern region in which a structure having a certain pattern is provided on a substrate.
Dependencies are inferred from the claim text.