Apparatus for critical-dimension localization microscopy

A process for performing critical-dimension localization microscopy, the process comprising:

• subjecting a first dimensional member and a second dimensional member of a reference artifact to critical-dimension metrology, the first dimensional member and the second dimensional member, in combination, comprising a critical dimension, and each of the first dimensional member and the second dimensional member independently provide optical contrast when the reference artifact is subjected to optical microscopy;
• determining a primary length L1 and a primary length uncertainty LU1 of the critical dimension from the critical-dimension metrology so that the critical dimension is traceable to International System of Units meter (SI-m);
• imaging in a calibrant optical field, by optical microscopy, the first dimensional member and the second dimensional member, the calibrant optical field disposed in an ocular optical field;
• determining, from the optical microscopy of the first dimensional member and the second dimensional member, a secondary length L2 and a secondary length uncertainty LU2 of the critical dimension subjected to the critical-dimension metrology;
• and
• calibrating the calibrant optical field and the secondary length L2, to the primary length L1 to establish traceability of the secondary length L2 to the International System of Units meter SI-m to perform critical-dimension localization microscopy.

An apparatus for critical-dimension localization microscopy for performing critical-dimension localization microscopy and comprising:

• a critical-dimension metrolog that:
• subjects a reference artifact to critical-dimension metrology, the reference artifact comprising a critical dimension;
• and
• produces metrology data of the reference artifact from the critical-dimension metrology;
• an optical microscope comprising:
• an ocular optical field;
• and
• a calibrant optical field disposed in the ocular optical field, such that the optical microscope:
• receives the reference artifact in die calibrant optical field, the reference artifact being subjected to the critical-dimension metrology;
• subjects the reference artifact in the calibrant optical field to optical microscopy;
• produces calibrant microscopy data from the reference artifact in the calibrant optical field;
• receives the reference artifact in the ocular optical field;
• subjects the reference artifact in the ocular optical field to optical microscopy;
• produces ocular microscopy data from the reference artifact in the ocular optical field;
• an analysis machine comprising:
• a first analyzer that:
• receives the metrology data from the critical-dimension metrolog;
• and
• produces calibration factors from the metrology data;
• a second analyzer that:
• receives the calibrant microscopy data from the optical microscope;
• receives the ocular microscopy data from the optical microscope;
• calibrates, with the calibration factors, the calibrant microscopy data and the ocular microscopy data to the critical dimension to produce traceable microscopy data from the calibrant microscopy data, the ocular microscopy data, and the calibration factors to establish traceability of the ocular optical field to the International System of Units meter SI-m.