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US 10,833,267 B2Granted
Structure and method to form phase change memory cell with self- align top electrode contact
AssigneeInternational Business Machines Corporation
InventorsInjo Ok, Myung-Hee Na, Nicole Saulnier, Balasubramanian Pranatharthiharan
Life of this patent
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Abstract
A self-align metal contact for a phase control memory (PCM) element is provided that mitigates unwanted residual tantalum nitride (TaN) particles that would otherwise remain after patterning a TaN surface using an RIE process.
Claims10
A memory array comprising a plurality of phase change memory elements, wherein at least one of the plurality of phase change memory elements comprises:
- a bottom element coupled to a landing pad of the at least one of the plurality of phase change memory elements;
- a GeSbTe portion coupled to the bottom element, wherein the GeSbTe portion is fully formed within a via extending from and above the bottom element, and wherein the via is directly coated with a metal liner and extends through a layer of low-k dielectric material and through an NBLOK material;
- a top electrode metal coupled to the GeSbTe portion;
- an NBLOK capping layer extending at least partially over the layer of low-k dielectric material;
- another layer of low-k dielectric material extending at least partially over the NBLOK capping layer;
- and
- a self-aligned metal contact coupled to the top electrode metal and extending through the another layer of low-k dielectric material and through the NBLOK capping layer and penetrating into the top electrode metal.
4 more elements
Dependencies are inferred from the claim text.