Composition for cleaning magnetic patterns
AssigneesSamsung Electronics Co., Ltd., Samyoung Pure Chemicals Co., Ltd.
InventorsHo-Young Kim, Jin-Hye Bae, Hoon Han, Won-Jun Lee, Chang-Kyu Lee, Geun-Joo Baek, Jung-Ig Jeon
Life of this patent
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Abstract
A composition for cleaning a magnetic pattern, a method of manufacturing a magnetic memory device, a method of forming a magnetic pattern, and a magnetic memory device, the composition including a glycol ether-based organic solvent; a decomposing agent that includes an aliphatic amine; and at least one of a chelating agent, or a cleaning accelerator that includes an organic alkaline compound, wherein the composition is devoid of water.
Claims20
A composition for cleaning a magnetic pattern, the composition comprising:
- a glycol ether-based organic solvent;
- about 4 weight percent to about 45 weight percent of a decomposing agent that includes an aliphatic amine, the weight percent being based on a total weight of the composition;
- and
- at least one of:
- a chelating agent, or
- a cleaning accelerator that includes an organic alkaline compound,
- wherein the composition is devoid of water,
- wherein the composition has a pH of about 9 to about 12.5.
A composition for cleaning a magnetic pattern, the composition comprising:
- about 50 weight percent to about 95 weight percent of a glycol ether-based organic solvent;
- about 4 weight percent to about 45 weight percent of a decomposing agent that includes an aliphatic amine;
- about 0.001 weight percent to about 5 weight percent of a cleaning accelerator that includes an organic alkaline compound;
- and
- about 0.001 weight percent to about 5 weight percent of a chelating agent, all weight percent being based on a total weight of the composition,
- wherein the composition has a pH of about 9 to about 12.5.
A composition for cleaning a magnetic pattern, the composition consisting essentially of:
- a glycol ether-based organic solvent;
- an aliphatic amine;
- and
- at least one of:
- a chelating agent, or
- an organic alkaline compound,
- wherein the composition has a pH of about 9 to about 12.5.
Dependencies are inferred from the claim text.