LDMOS transistors and associated systems and methods
AssigneeMaxim Integrated Products, Inc.
InventorsJohn Xia, Marco A. Zuniga, Badredin Fatemizadeh, Vijay Parthasarathy
Life of this patent
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Abstract
A lateral double-diffused metal-oxide-semiconductor field effect (LDMOS) transistor includes a silicon semiconductor structure, a dielectric layer at least partially disposed in a trench of the silicon semiconductor structure in a thickness direction, and a gate conductor embedded in the dielectric layer and extending into the trench in the thickness direction. The dielectric layer and the gate conductor are at least substantially symmetric with respect to a center axis of the trench extending in the thickness direction, as seen when the LDMOS transistor is viewed cross-sectionally in a direction orthogonal to the lateral and thickness directions.
Claims17
A lateral double-diffused metal-oxide-semiconductor field effect (LDMOS) transistor, comprising:
- a silicon semiconductor structure, including a source region and a drain region separated from each other in a lateral direction, the source region including a source n+ region formed in a p-body, and the drain region including a drain n+ region;
- and
- a gate structure formed at least partially in a trench of the silicon semiconductor structure between the source region and the drain region in the lateral direction, the gate structure being at least substantially symmetrical, as seen when the LDMOS transistor is viewed cross-sectionally in a direction orthogonal to the lateral direction, the gate structure including:
- a dielectric layer at least partially disposed in the trench in a thickness direction, the thickness direction being orthogonal to the lateral direction, and
- a gate conductor embedded in the dielectric layer and extending into the trench in the thickness direction,
- wherein the p-body borders the trench in the lateral direction.
A lateral double-diffused metal-oxide-semiconductor field effect (LDMOS) transistor, comprising:
- a silicon semiconductor structure, including a source region and a drain region separated from each other in a lateral direction;
- a gate structure formed at least partially in a trench of the silicon semiconductor structure between the source region and the drain region in the lateral direction, wherein:
- the gate structure includes a dielectric layer and a gate conductor, the dielectric layer being at least partially disposed in the trench in a thickness direction, the thickness direction being orthogonal to the lateral direction, and the gate conductor being embedded in the dielectric layer and extending into the trench in the thickness direction, and
- a portion of the gate conductor extends above the silicon semiconductor structure and forms a u-shape that is at least substantially symmetrical, as seen when the LDMOS transistor is viewed cross-sectionally in a direction orthogonal to the lateral direction;
- and
- a first spacer and a second spacer bounding the gate structure on a first outer surface of the silicon semiconductor structure, the trench extending into the silicon semiconductor structure in the thickness direction from the first outer surface of the silicon semiconductor structure.
A lateral double-diffused metal-oxide-semiconductor field effect (LDMOS) transistor, comprising:
- a silicon semiconductor structure, including a source region and a drain region separated from each other in a lateral direction;
- and
- a gate structure formed at least partially in a trench of the silicon semiconductor structure between the source region and the drain region in the lateral direction, the trench extending into the silicon semiconductor structure in a thickness direction from a first outer surface of the silicon semiconductor structure, the thickness direction being orthogonal to the lateral direction, the gate structure being at least substantially symmetrical, as seen when the LDMOS transistor is viewed cross-sectionally in a direction orthogonal to the lateral direction, the gate structure including:
- a dielectric layer at least partially disposed in the trench in the thickness direction, and
- a gate conductor embedded in the dielectric layer and extending into the trench in the thickness direction,
- a first spacer and a second spacer bounding the gate structure on the first outer surface of the silicon semiconductor structure.
Dependencies are inferred from the claim text.