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US 10,833,117 B2Granted
Image sensor including a first and a second isolation layer
AssigneeSamsung Electronics Co., Ltd.
InventorEun Sub Shim
Life of this patent
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Abstract
An image sensor is provided comprising a substrate comprising first and second surfaces opposite to each other. A first isolation layer is disposed on the substrate and forms a boundary of a sensing region. A second isolation layer is disposed at least partially in the substrate within the sensing region and has a closed line shape. A photoelectric conversion device is disposed within the closed line shape of the second isolation layer, and a color filter is disposed on the first surface of the substrate.
Claims19
An image sensor comprising:
- a substrate comprising a first surface and a second surface opposite to each other;
- a first isolation layer disposed on the substrate and forming a boundary of a sensing region;
- a second isolation layer disposed at least partially in the substrate within the sensing region and having a closed line shape;
- a photoelectric conversion device disposed within the closed line shape of the second isolation layer;
- and
- a color filter disposed on the first surface of the substrate,
- wherein the first isolation layer is spaced apart from the second isolation layer along a first direction, and
- wherein the first isolation layer has a first width along the first direction and the second isolation layer has a second width narrower than the first width along the first direction.
5 more elements
An image sensor comprising:
- a substrate comprising a first surface and a second surface opposite to each other;
- a photoelectric conversion device disposed within the substrate;
- a first trench disposed in the substrate;
- a first isolation layer disposed in the first trench and forming a boundary of a sensing region;
- a second trench spaced apart from the first trench and formed in the substrate of the sensing region;
- a second isolation layer disposed in the second trench and surrounding the photoelectric conversion device, wherein a material of the second isolation layer is different from a material of the first isolation layer;
- and
- a color filter disposed on the substrate in the sensing region,
- wherein the first isolation layer is spaced apart from the second isolation layer along a first direction, and
- wherein the first isolation layer has a first width along the first direction and the second isolation layer has a second width narrower than the first width along the first direction.
7 more elements
An image sensor comprising:
- a substrate comprising a first surface and a second surface opposite to each other;
- a first isolation layer disposed in the substrate and forming a boundary of each of a first sensing region and a second sensing region;
- a second isolation layer disposed in the substrate of the first sensing region, the second isolation layer having a closed line shape;
- a photoelectric conversion device disposed in the substrate within the closed line shape of the second isolation layer;
- a color filter disposed on the first surface of the substrate on the first sensing region;
- and
- an infrared filter disposed on the first surface of the substrate on the second sensing region,
- wherein the first isolation layer is spaced apart from the second isolation layer along a first direction, and
- wherein the first isolation layer has a first width along the first direction and the second isolation layer has a second width narrower than the first width along the first direction.
6 more elements
Dependencies are inferred from the claim text.