Method of generating a training set usable for examination of a semiconductor specimen and system thereof
AssigneeApplied Materials Israel Ltd.
InventorsOhad Shaubi, Assaf Asbag, Boaz Cohen
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AssigneeApplied Materials Israel Ltd.
InventorsOhad Shaubi, Assaf Asbag, Boaz Cohen
Estimating the term…
There is provided a method of examination of a semiconductor specimen. The method comprises: upon obtaining by a computer a Deep Neural Network (DNN) trained for a given examination-related application within a semiconductor fabrication process, processing together one or more fabrication process (FP) images using the obtained trained DNN, wherein the DNN is trained using a training set comprising synthetic images specific for the given application; and obtaining, by the computer, examination-related data specific for the given application, and characterizing at least one of the processed one or more FP images. Generating the training set can comprise: training an auxiliary DNN to generate a latent space, generating a synthetic image by applying the trained auxiliary DNN to a point selected in the generated latent space, and adding the generated synthetic image to the training set.
A method of generating a training set usable for classifying defects in-a semiconductor specimen, the method executed by a computer and comprising:
A system to generate a training set usable for classifying defects in a semiconductor specimen, the system comprising a processing and memory circuitry configured to:
A non-transitory computer readable medium comprising instructions that, when executed by a computer, cause the computer to perform generating a training set usable for classifying defects in a semiconductor specimen, the generating the training set comprising:
Dependencies are inferred from the claim text.