Probe systems and methods for calibrating capacitive height sensing measurements

A method of utilizing a probe system to generate a calibrated capacitive height measurement, wherein the probe system includes a probe assembly with a probe support body that supports a capacitive displacement sensor that terminates in a sensing tip that is configured to be positioned in a spaced-apart relation relative to a substrate, and wherein the capacitive displacement sensor is configured to generate an uncalibrated capacitive height measurement that at least partially represents a sensing tip distance of the sensing tip from the substrate, the method comprising:

• receiving, with a controller, a height calibration structure architecture of a height calibration structure of the substrate, wherein the height calibration structure architecture includes information regarding one or more substrate layers of the height calibration structure;
• calculating, with the controller and based, at least in part, on the height calibration structure architecture, a layer impedance magnitude of each substrate layer of the one or more substrate layers;
• calculating, with the controller and based, at least in part, on the calculating the layer impedance magnitude of each substrate layer of the one or more substrate layers, a total layer impedance magnitude of the height calibration structure;
• measuring, with the capacitive displacement sensor, a measured impedance magnitude;
• and
• calculating, with the controller and based, at least in part, on the total layer impedance magnitude and the measured impedance magnitude, the calibrated capacitive height measurement.