Process for the generation of thin inorganic films

A process, comprising bringing a compound selected from the group consisting of formula (Ia), formula (Ib), and a dimer of formula (Ic) into

• Ln - - - M - - - Xm (I)
• and depositing the compound from a gaseous or aerosol state onto a solid substrate,
• wherein:
• the compound of formula (Ia) is
• wherein R1 and R2 are each independently nothing, hydrogen, an alkyl group, an aryl group or a silyl group,
• wherein R3 and R4 are each independently an alkyl group, an aryl group or a silyl group,
• the compound of formula (Ib) is
• wherein R5 is nothing, hydrogen, an alkyl group, an aryl group or a silyl group, and
• wherein R6 to R9 are each independently hydrogen, an alkyl group, an aryl group or a silyl group,
• the dimer of formula (Ic) is
• wherein R5 is an alkyl group, an aryl group or a silyl group
• M is a metal,
• X is a ligand which coordinates to M,
• n is 1 to 5, and
• m is 0 to 5.