Photocuring method, compound and composition used therein

A photocuring resin composition comprising (A) compound having a carbonyl group generating a radical by photoirradiation and a carboxyl group decarboxylated by photoirradiation, (D) silane compound having a mercapto group or a (meth)acryl group and at least one silanol group, and (E) compound having a carbonyl group generating a radical by photoirradiation and a group generating a base by being decarboxylated by photoirradiation, wherein the composition may further comprise (F) compound having at least two polymerizable unsaturated groups,

• wherein the compound (E) is a compound represented by a general formula [4];
• wherein R15 to R22 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an aryl group having 6 to 14 carbon atoms, an arylalkyl group having 7 to 15 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a halogen atom, a nitro group, a group represented by a general formula [2], or a group represented by a general formula [3], R23 and R24 each independently represent a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an aryl group having 6 to 14 carbon atoms, an arylalkyl group having 7 to 15 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, a halogen atom, or a nitro group;
• or represent a state where R23 and R24 are bonded to each other through an oxygen atom, a sulfur atom, or a carbonyl group, provided that at least one of the groups represented by R15 to R22 is the group represented by the general formula [3];
• wherein R11 and R12 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a hydroxyalkyl group having 1 to 6 carbon atoms;
• wherein Z1+ represents a biguanidinium cation, and R11 and R14 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or a hydroxyalkyl group having 1 to 6 carbon atoms.