# US 10,768,538 B2 · Lithographic apparatus and device manufacturing method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,768,538 B2 - Document ID: US10768538B2 - Status: Granted - Kind: B2 - Application number: 16/656,755 - Filed: 2019-10-18 - Published: 2020-02-20 - Granted: 2020-09-08 - Earliest claimed: 2003-12-23 - Assignees: ASML Netherlands B.V. - Applicants: Asml Netherlands B.V. - Inventors: Helmar Van Santen; Aleksey Yurievich Kolesnychenko - Web page: https://patentgrep.com/patent/US10768538B2 ## CPC - G03F 7/70866: {of mask or workpiece} - G03F 7/70341: {Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041)} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate. ## Claims ### Claim 1 A liquid handling system for a lithographic apparatus, the lithographic apparatus comprising a substrate table configured to hold a substrate and a projection system configured to project a patterned beam onto a target portion of the substrate, the liquid handling system comprising: a barrier member arranged to extend along at least a part of a boundary of a space between the substrate table and the projection system, the barrier member comprising: one or more liquid supply openings configured to provide liquid to the space, the one or more liquid openings arranged to face toward the substrate table and located on opposite sides of a path of the beam through the space; and a lower horizontal surface below the one or more liquid supply openings, the lower horizontal surface arranged to face toward the substrate table. ### Claim 2 (depends on 1) The liquid handing system of claim 1, further comprising an outlet configured to remove liquid, the outlet outward, relative a center of the barrier member, of the inlet and arranged to be located above the substrate table, at a time of supply of liquid by the liquid supply system. ### Claim 3 (depends on 1) The liquid handling system of claim 1, wherein at least part of the barrier member extends below the one or more liquid supply openings and has the lower horizontal surface and the at least part of the barrier member being outward, relative to the path of the beam through the space, of the one or more liquid supply openings. ### Claim 4 (depends on 1) The liquid handling system of claim 1, wherein the barrier member comprises an aperture, at a central portion of the barrier, arranged to have the beam passes therethrough. ### Claim 5 (depends on 1) The liquid handling system of claim 1, wherein the barrier member is arranged to extend above a bottom surface of a final optical element of the projection system and to surround the final optical element. ### Claim 6 (depends on 1) The liquid handling system of claim 1, wherein the barrier member is configured to be mechanically isolated from the projection system and/or further comprises an actuator configured to adjust a height and/or tilt of the barrier member relative to the substrate table. ### Claim 7 (depends on 1) The liquid handling system of claim 1, wherein the barrier member comprises a chamber to which the one or more supply openings are connected. ### Claim 8 (depends on 1) A lithographic apparatus comprising: a substrate table configured to hold a substrate; a projection system configured to project a patterned beam onto a target portion of the substrate; and the liquid handling system of claim 1. ### Claim 9 A liquid handling system for a lithographic apparatus, the lithographic apparatus comprising a substrate table configured to hold a substrate and a projection system configured to project a patterned beam onto a target portion of the substrate, the liquid handling system comprising: a barrier member arranged to extend along at least a part of a boundary of a space between the substrate table and the projection system, the barrier member comprising: one or more liquid supply openings configured to provide liquid to the space, the one or more liquid supply openings located on opposite sides of a path of the beam through the space; and a lower horizontal surface below the one or more liquid supply openings, the lower horizontal surface arranged to be substantially parallel to an upper surface of the substrate table and the one or more liquid openings having a cross-section substantially parallel to lower horizontal surface. ### Claim 10 (depends on 9) The liquid handing system of claim 9, further comprising an outlet configured to remove liquid, the outlet outward, relative a center of the barrier member, of the inlet and arranged to be located above the substrate table, at a time of supply of liquid by the liquid supply system. ### Claim 11 (depends on 9) The liquid handling system of claim 9, wherein at least part of the barrier member extends below the one or more liquid supply openings and has the lower horizontal surface and the at least part of the barrier member being outward, relative to the path of the beam through the space, of the one or more liquid supply openings. ### Claim 12 (depends on 9) The liquid handling system of claim 9, wherein the barrier member comprises an aperture, at a central portion of the barrier, arranged to have the beam passes therethrough. ### Claim 13 (depends on 9) The liquid handling system of claim 9, wherein the barrier member is arranged to extend above a bottom surface of a final optical element of the projection system and to surround the final optical element. ### Claim 14 (depends on 9) The liquid handling system of claim 9, wherein the barrier member is configured to be mechanically isolated from the projection system and/or further comprises an actuator configured to adjust a height and/or tilt of the barrier member relative to the substrate table. ### Claim 15 (depends on 9) The liquid handling system of claim 9, wherein the barrier member comprises a chamber to which the one or more supply openings are connected. ### Claim 16 (depends on 9) A lithographic apparatus comprising: a substrate table configured to hold a substrate; a projection system configured to project a patterned beam onto a target portion of the substrate; and the liquid handling system of claim 9. ### Claim 17 A liquid handling system for a lithographic apparatus, the lithographic apparatus comprising a substrate table configured to hold a substrate and a projection system configured to project a patterned beam onto a target portion of the substrate, the liquid handling system comprising: a barrier member arranged to extend along at least a part of a boundary of a space between the substrate table and the projection system, the barrier member comprising: one or more liquid supply openings configured to provide liquid to the space, the one or more liquid supply openings surrounding a path of the beam through the space and having one or more cross-sections arranged to be substantially parallel to an upper surface of the substrate when located on the substrate table; and a lower horizontal surface below the one or more liquid supply openings, the lower horizontal surface arranged to be substantially parallel to the upper surface of the substrate when located on the substrate table. ### Claim 18 (depends on 17) The liquid handling system of claim 17, further comprising an outlet configured to remove liquid, the outlet outward, relative a center of the barrier member, of the inlet and arranged to be located above the substrate table, at a time of supply of liquid by the liquid supply system. ### Claim 19 (depends on 17) The liquid handling system of claim 17, wherein the barrier member comprises an aperture, at a central portion of the barrier, arranged to have the beam passes therethrough. ### Claim 20 (depends on 17) A lithographic apparatus comprising: a substrate table configured to hold a substrate; a projection system configured to project a patterned beam onto a target portion of the substrate; and the liquid handling system of claim 17.