# US 10,768,524 B2 · Photomask blank substrate container, method for storing photomask blank substrate and method for transporting photomask blank substrate > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,768,524 B2 - Document ID: US10768524B2 - Status: Granted - Kind: B2 - Application number: 15/477,599 - Filed: 2017-04-03 - Published: 2017-10-12 - Granted: 2020-09-08 - Earliest claimed: 2016-04-07 - Assignees: Shin-Etsu Chemical Co., Ltd. - Applicants: Shin-Etsu Chemical Co., Ltd. - Inventors: Shogo Ito; Ryuji Koitabashi - Web page: https://patentgrep.com/patent/US10768524B2 ## CPC - G03F 1/66: Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof - G03F 1/60: Substrates - H10P 72/1906: {specially adapted for containing masks, reticles or pellicles} - H10P 72/1916: {characterised by sealing arrangements} - H10P 72/1926: {characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier} - G03F 7/70975: {Assembly, maintenance, transport or storage of apparatus} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract A photomask blank substrate container having an inner member, inner cassette and retainer member, container main body having a lower box and an upper lid, and a sealing tape, in which the container main body and inner member include a polymer-based material in which when 0.1 g of a sample thereof is retained at 40° C. for 60 minutes to release an outgas component, the outgas total amount detected by a gas chromatography mass spectrometer is 1.9×103 ng or less in terms of n-tetradecane, and the sealing tape is a material in which when a size of 10 mm×10 mm of a sample thereof is retained at 150° C. for 10 minutes to release an outgas component, the outgas total amount detected by a gas chromatography mass spectrometer is 1.8×103 ng or less in terms of n-tetradecane. This photomask blank substrate container allows storing and transporting the photomask blank substrate while suppressing influence on the resist pattern. ## Claims ### Claim 1 A photomask blank substrate container for containing a photomask blank substrate, comprising an inner member having an inner cassette capable of containing the photomask blank substrate, and a retainer member for fixing the photomask blank substrate contained in the inner cassette from above, a container main body having a lower box capable of containing the inner cassette, and an upper lid capable of engaging with the retainer member to an inside, and a sealing tape for sealing the container main body, the lower box engaging with the upper lid directly, wherein the container main body and the inner member comprise a polymer-based material in which when 0.1 g of a sample thereof is retained at 40° C. for 60 minutes to release an outgas component, a total amount of the outgas detected by a gas chromatography mass spectrometer is 500 ng or less in terms of n-tetradecane, the sealing tape is a material in which when a size of 10 mm×10 mm of a sample thereof is retained at 150° C. for 10 minutes to release an outgas component, a total amount of the outgas detected by a gas chromatography mass spectrometer is 1.0×103 ng or less in terms of n-tetradecane, the photomask blank substrate is a material onto which a chemical amplification type resist has been coated, wherein the container main body comprises a polymer-based material containing a polycarbonate as a main component, and a surface resistance value thereof is 2.0×104 Ω/sq or less, and the sealing tape has: (i) a substrate comprising a polymer selected from the group consisting of polyethylene terephthalate, polypropylene and polyethylene, and (ii) an adhesive surface comprising polyacrylic ester. ### Claim 2 (depends on 1) The photomask blank substrate container according to claim 1, wherein the inner member comprises a polymer-based material in which when 2 g of a sample thereof is retained at 100° C. for 20 minutes to release an outgas component, the total amount of the outgas detected by a gas chromatography mass spectrometer is 1.0×103 ng or less in terms of n-tetradecane. ### Claim 3 (depends on 1) The photomask blank substrate container according to claim 1, wherein a sum of a total amount of outgas by outgas component generated from an inner surface of the container main body, and a total amount of outgas by outgas component generated from a surface of the inner member is less than 3.0×103 μg, and a total amount of outgas by outgas component generated from the sealing tape sealing the container main body is less than 1.4×102 μg. ### Claim 4 (depends on 2) The photomask blank substrate container according to claim 2, wherein a sum of a total amount of outgas by outgas component generated from an inner surface of the container main body, and a total amount of outgas by outgas component generated from a surface of the inner member is less than 3.0×103 μg, and a total amount of outgas by outgas component generated from the sealing tape sealing the container main body is less than 1.4×102 μg. ### Claim 5 (depends on 1) A method of storing a photomask blank substrate which comprises storing the photomask blank substrate with the photomask blank substrate contained in the photomask blank substrate container according to claim 1. ### Claim 6 (depends on 1) A method of transporting a photomask blank substrate which comprises transporting the photomask blank substrate with the photomask blank substrate contained in the photomask blank substrate container according to claim 1.