# US 10,767,260 B2 · Substrate processing apparatus, vaporization system and mist filter > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,767,260 B2 - Document ID: US10767260B2 - Status: Granted - Kind: B2 - Application number: 15/919,002 - Filed: 2018-03-12 - Published: 2018-09-27 - Granted: 2020-09-08 - Earliest claimed: 2017-03-27 - Assignees: Kokusai Electric Corporation - Applicants: Hitachi Kokusai Electric Inc. - Inventors: Kosuke Takagi; Atsushi Hirano - Web page: https://patentgrep.com/patent/US10767260B2 ## CPC - C23C 16/4402: {Reduction of impurities in the source gas} - C23C 16/405: {of refractory metals or yttrium} - C23C 16/448: characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials - C23C 16/45544: {characterized by the apparatus} - C23C 16/45578: {Elongated nozzles, tubes with holes} - H10P 72/0402: {Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence)} - B01D 45/08: by impingement against baffle separators - B01D 50/20: Combinations of devices covered by groups B01D45/00 and B01D46/00 - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - B01D: SEPARATION (separating solids from solids by wet methods B03B, B03D; by pneumatic jigs or tables B03B; by other dry methods B07; magnetic or electrostatic separation of solid materials from solid materials or fluids, separation by high-voltage electric fields B03C; centrifuges, vortex apparatus B04; presses per se for squeezing-out liquid from liquid-containing material B30B9/02; treatment of water C02F, e.g. softening by ion-exchange C02F1/42; {arrangements of air intake cleaners in gas turbine plants F02C7/05} ; arrangements or mounting of filters in air-conditioning, air-humidification or ventilation F24F13/28) ## Abstract A substrate processing apparatus includes a process chamber accommodating a substrate; a gas supply system; and an exhaust system. The supply system includes a vaporizer and a mist filter, the mist filter including a plurality of first plates and a plurality of second plates. Each of the first plates includes a first plate portion having a plurality of first grooves on a surface thereof and a first flow path. Each of the second plates includes a second plate portion having a plurality of second grooves on a surface thereof and a second flow path. When the plurality of first and second plates are arranged alternatively, the plurality of first grooves are configured to face the second flow path and the plurality of second grooves are configured to face the first flow path, such that the first flow path and the second flow path are not in-line. ## Claims ### Claim 1 A substrate processing apparatus comprising: a process chamber accommodating a substrate; a process gas supply system configured to supply a process gas into the process chamber; and an exhaust system configured to exhaust the process chamber; wherein the process gas supply system comprises: a vaporizer and a mist filter provided at a downstream side of the vaporizer, the mist filter comprising: a plurality of first plates and a plurality of second plates, each of the plurality of first plates comprising: a first plate portion provided with a plurality of first grooves provided on a surface thereof and a first flow path wherethrough a source in mist state flows, each of the plurality of second plates comprising: a second plate portion provided with a plurality of second grooves provided on a surface thereof and a second flow path wherethrough the source in mist state flows, and wherein when the plurality of first plates and the plurality of second plates are arranged alternately, the plurality of first grooves are configured to face the second flow path and the plurality of second grooves are configured to face the first flow path, such that the first flow path and the second flow path are not in-line, wherein each of the plurality of first grooves is one of V-shaped, rectangular, trapezoidal and U-shaped such that the surface where the plurality of first grooves are provided is uneven, and each of the plurality of second grooves is one of V-shaped, rectangular, trapezoidal and U-shaped such that the surface where the plurality of second grooves are provided is uneven, and wherein a depth-to-width ratio of each of the plurality of first grooves ranges from 0.5 to 2, and a depth-to-width ratio of each of the plurality of second grooves ranges from 0.5 to 2. ### Claim 2 (depends on 1) The substrate processing apparatus of claim 1, wherein the plurality of first plates and the plurality of second plates are alternately arranged, the plurality of first grooves are provided at a center portion of each of the first plate portion, and the plurality of second grooves are provided at a peripheral portion of each of the second plate portion. ### Claim 3 A substrate processing apparatus comprising: a process chamber accommodating a substrate; a process gas supply system configured to supply a process gas into the process chamber; and an exhaust system configured to exhaust the process chamber; wherein the process gas supply system comprises: a vaporizer and a mist filter provided at a downstream side of the vaporizer, the mist filter comprising: a plurality of first plates and a plurality of second plates, each of the plurality of first plates comprising: a first plate portion provided with a plurality of first grooves provided on a surface thereof and a first flow path wherethrough a source in mist state flows, each of the plurality of second plates comprising: a second plate portion provided with a plurality of second grooves provided on a surface thereof and a second flow path wherethrough the source in mist state flows, and wherein when the plurality of first plates and the plurality of second plates are arranged alternately, the plurality of first grooves are configured to face the second flow path and the plurality of second grooves are configured to face the first flow path, such that the first flow path and the second flow path are not in-line, wherein each of the plurality of first grooves is one of V-shaped, rectangular, trapezoidal and U-shaped such that the surface where the plurality of first grooves are provided is uneven, and each of the plurality of second grooves is one of V-shaped, rectangular, trapezoidal and U-shaped such that the surface where the plurality of second grooves are provided is uneven, and wherein an opening angle of each of the plurality of first grooves ranges from 60 to 120 degrees, and an opening angle of each of the plurality of second grooves ranges from 60 to 120 degrees. ### Claim 4 (depends on 1) The substrate processing apparatus of claim 1, wherein the plurality of first grooves are concentrically arranged with respect to a center of each of the plurality of first plates at equal distance therebetween, and the plurality of second grooves are concentrically arranged with respect to a center of each of the plurality of second plates at equal distance therebetween. ### Claim 5 (depends on 1) The substrate processing apparatus of claim 1, wherein a peripheral portion of the first plate portion is provided with a plurality of first holes defining the first flow path and a center portion of the first plate portion is provided with the plurality of first grooves, and a center portion of the second plate portion is provided with a plurality of second holes defining the second flow path and a peripheral portion of the second plate portion is provided with the plurality of second grooves, and wherein each of the plurality of first plates further comprises a first circumferential portion thicker than the first plate portion and provided along the peripheral portion of the first plate portion, and each of the plurality of second plates further comprises a second circumferential portion thicker than the second plate portion and provided along the peripheral portion of the second plate portion such that a space is defined between the first plate portion and the second the plate portion when the plurality of first plates and the plurality of second plates are alternately arranged with the first circumferential portion in contact with the second circumferential portion. ### Claim 6 (depends on 1) The substrate processing apparatus of claim 1, wherein a peripheral portion of the first plate portion is provided with a plurality of first holes defining the first flow path, a center portion of the second plate portion is provided with a plurality of second holes defining the second flow path and the plurality of first plates and the plurality of second plates are alternately arranged. ### Claim 7 (depends on 1) The substrate processing apparatus of claim 1, wherein the process gas supply system further comprises a gas filter provided at a downstream side of the mist filter. ### Claim 8 (depends on 7) The substrate processing apparatus of claim 7, wherein the vaporizer, the mist filter and the gas filter are separable from one another. ### Claim 9 (depends on 1) The substrate processing apparatus of claim 1, wherein the mist filter further comprises a heater configured to heat at least the plurality of first plates and the plurality of second plates. ### Claim 10 (depends on 1) The substrate processing apparatus of claim 1, wherein each of the plurality of first plates and the plurality of second plates is made of metal. ### Claim 11 (depends on 1) The substrate processing apparatus of claim 1, wherein the plurality of first plates and the plurality of second plates have a same shape except locations of the plurality of first grooves, the plurality of second grooves, a plurality of first holes defining the first flow path and a plurality of second holes defining the second flow path. ### Claim 12 A vaporizer system comprising: a vaporizer; and a mist filter provided at a downstream side of the vaporizer, the mist filter comprising: a plurality of first plates and a plurality of second plates, each of the plurality of first plates comprising: a first plate portion provided with a plurality of first grooves provided on a surface thereof and a first flow path wherethrough a source in mist state flows, each of the plurality of second plates comprising: a second plate portion provided with a plurality of second grooves provided on a surface thereof and a second flow path wherethrough the source in mist state flows, and wherein when the plurality of first plates and the plurality of second plates are arranged alternately, the plurality of first grooves are configured to face the second flow path and the plurality of second grooves are configured to the first flow path, such that the first flow path and the second flow path are not in-line, wherein each of the plurality of first grooves is one of V-shaped, rectangular, trapezoidal and U-shaped such that the surface where the plurality of first grooves are provided is uneven, and each of the plurality of second grooves is one of V-shaped, rectangular, trapezoidal and U-shaped such that the surface where the plurality of second grooves are provided is uneven, and wherein a depth-to-width ratio of each of the plurality of first grooves ranges from 0.5 to 2, and a depth-to-width ratio of each of the plurality of second grooves ranges from 0.5 to 2. ### Claim 13 A mist filter comprising: a plurality of first plates wherein each of the plurality of first plates comprises a first plate portion provided with a plurality of first grooves provided on a surface thereof and a first flow path wherethrough a source in mist state flows; and a plurality of second plates wherein each of the plurality of second plates comprises a second plate portion provided with a plurality of second grooves provided on a surface thereof and a second flow path wherethrough the source in mist state flows, wherein when the plurality of first plates and the plurality of second plates are arranged alternately, the plurality of first grooves are configured to face the second flow path and the plurality of second grooves are configured to face the first flow path, such that the first flow path and the second flow path are not in-line, wherein each of the plurality of first grooves is one of V-shaped, rectangular, trapezoidal and U-shaped such that the surface where the plurality of first grooves are provided is uneven, and each of the plurality of second grooves is one of V-shaped, rectangular, trapezoidal and U-shaped such that the surface where the plurality of second grooves are provided is uneven, and wherein a depth-to-width ratio of each of the plurality of first grooves ranges from 0.5 to 2, and a depth-to-width ratio of each of the plurality of second grooves ranges from 0.5 to 2.